Takehiko Fujita

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Group III nitride semiconductor light-emitting element and method o...
- Patent number 11,024,769
- Issue date Jun 1, 2021
- Dowa Electronics Materials Co., Ltd.
- Yasuhiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride semiconductor light-emitting element and method o...
- Patent number 10,991,850
- Issue date Apr 27, 2021
- Dowa Electronics Materials Co., Ltd.
- Yasuhiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Group III nitride semiconductor light-emitting element and method o...
- Patent number 10,573,783
- Issue date Feb 25, 2020
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Yasuhiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
III-nitride semiconductor light emitting device and method of produ...
- Patent number 10,193,016
- Issue date Jan 29, 2019
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Takehiko Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing III nitride semiconductor light-emitting device...
- Patent number 10,062,806
- Issue date Aug 28, 2018
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Takehiko Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
III nitride semiconductor light-emitting device
- Patent number 9,882,088
- Issue date Jan 30, 2018
- Dowa Electronics Materials Co., Ltd.
- Takehiko Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 8,168,270
- Issue date May 1, 2012
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for performing semiconductor processing on target...
- Patent number 8,153,451
- Issue date Apr 10, 2012
- Tokyo Electron Limited
- Koichi Sakamoto
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Oxidation method providing parallel gas flow over substrates in a s...
- Patent number 8,124,181
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Kazuhide Hasebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for using film formation apparatus
- Patent number 7,938,080
- Issue date May 10, 2011
- Tokyo Electron Limited
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for forming silicon oxide film
- Patent number 7,906,168
- Issue date Mar 15, 2011
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidation method and apparatus for semiconductor process
- Patent number 7,795,158
- Issue date Sep 14, 2010
- Tokyo Electron Limited
- Takehiko Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical CVD apparatus for forming silicon-germanium film
- Patent number 7,648,895
- Issue date Jan 19, 2010
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for using film formation apparatus
- Patent number 7,494,943
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and apparatus for semiconductor process
- Patent number 7,273,818
- Issue date Sep 25, 2007
- Tokyo Electron Limited
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat-processing method for semiconductor process under a vacuum pre...
- Patent number 7,211,514
- Issue date May 1, 2007
- Tokyo Electron Limited
- Takehiko Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for performing semiconductor processing on substr...
- Patent number 7,179,334
- Issue date Feb 20, 2007
- Tokyo Electron Limited
- Koichi Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD O...
- Publication number 20210193874
- Publication date Jun 24, 2021
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Yasuhiro WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD O...
- Publication number 20200006599
- Publication date Jan 2, 2020
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Yasuhiro WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD O...
- Publication number 20190006558
- Publication date Jan 3, 2019
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Yasuhiro WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
III-NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD OF PRODU...
- Publication number 20180019375
- Publication date Jan 18, 2018
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Takehiko FUJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE...
- Publication number 20170338378
- Publication date Nov 23, 2017
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Takehiko FUJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD OF PRODU...
- Publication number 20160268477
- Publication date Sep 15, 2016
- DOWA ELECTRONICS MATERIALS CO., LTD.
- Takehiko FUJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS
- Publication number 20100319619
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Takehiko FUJITA
- C30 - CRYSTAL GROWTH
Information Patent Application
VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM
- Publication number 20090104760
- Publication date Apr 23, 2009
- TOKYO ELECTON LIMITED
- Masaki KUROKAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR USING FILM FORMATION APPARATUS
- Publication number 20090090300
- Publication date Apr 9, 2009
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20080107824
- Publication date May 8, 2008
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxidation apparatus and method for semiconductor process
- Publication number 20080095678
- Publication date Apr 24, 2008
- Kazuhide Hasebe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film formation method and apparatus for forming silicon oxide film
- Publication number 20080081104
- Publication date Apr 3, 2008
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxidation method and apparatus for semiconductor process
- Publication number 20080057199
- Publication date Mar 6, 2008
- Takehiko Fujita
- C30 - CRYSTAL GROWTH
Information Patent Application
SYSTEM AND METHOD FOR PERFORMING SEMICONDUCTOR PROCESSING ON TARGET...
- Publication number 20070131537
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- KOICHI SAKAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for using film formation apparatus
- Publication number 20070093075
- Publication date Apr 26, 2007
- Naotaka Noro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treating system and heat treating method
- Publication number 20060099805
- Publication date May 11, 2006
- Takehiko Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction in size of hemispherical grains of hemispherical grained...
- Publication number 20060021570
- Publication date Feb 2, 2006
- Kazuhide Hasebe
- C30 - CRYSTAL GROWTH
Information Patent Application
Vertical CVD apparatus for forming silicon-germanium film
- Publication number 20050181586
- Publication date Aug 18, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film formation method and apparatus for semiconductor process
- Publication number 20050170617
- Publication date Aug 4, 2005
- Masaki Kurokawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat-processing method and apparatus for semiconductor process
- Publication number 20050095826
- Publication date May 5, 2005
- Takehiko Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for performing semiconductor processing on substr...
- Publication number 20040159284
- Publication date Aug 19, 2004
- Koichi Sakamoto
- H01 - BASIC ELECTRIC ELEMENTS

Takehiko Fujita

Person

Patents Grantslast 30 patents

Group III nitride semiconductor light-emitting element and method o...

Group III nitride semiconductor light-emitting element and method o...

Group III nitride semiconductor light-emitting element and method o...

III-nitride semiconductor light emitting device and method of produ...

Method of producing III nitride semiconductor light-emitting device...

III nitride semiconductor light-emitting device

Film formation method and apparatus for semiconductor process

System and method for performing semiconductor processing on target...

Oxidation method providing parallel gas flow over substrates in a s...

Method for using film formation apparatus

Film formation method and apparatus for forming silicon oxide film

Oxidation method and apparatus for semiconductor process

Vertical CVD apparatus for forming silicon-germanium film

Method for using film formation apparatus

Film formation method and apparatus for semiconductor process

Heat-processing method for semiconductor process under a vacuum pre...

System and method for performing semiconductor processing on substr...

Patents Applicationslast 30 patents

GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD O...

GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD O...

GROUP III NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD O...

III-NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD OF PRODU...

METHOD OF PRODUCING III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE...

III NITRIDE SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD OF PRODU...

OXIDATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS

VERTICAL CVD APPPARATUS FOR FORMING SILICON-GERMANIUM FILM

METHOD FOR USING FILM FORMATION APPARATUS

Film formation method and apparatus for semiconductor process

Oxidation apparatus and method for semiconductor process

Film formation method and apparatus for forming silicon oxide film

Oxidation method and apparatus for semiconductor process

SYSTEM AND METHOD FOR PERFORMING SEMICONDUCTOR PROCESSING ON TARGET...

Method for using film formation apparatus

Heat treating system and heat treating method

Reduction in size of hemispherical grains of hemispherical grained...

Vertical CVD apparatus for forming silicon-germanium film

Film formation method and apparatus for semiconductor process

Heat-processing method and apparatus for semiconductor process

System and method for performing semiconductor processing on substr...