Takehiko Naruoka

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,705,331
- Issue date Jul 18, 2023
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for film formation, film-forming method and directed se...
- Patent number 11,460,767
- Issue date Oct 4, 2022
- JSR Corporation
- Hiroyuki Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 11,370,872
- Issue date Jun 28, 2022
- JSR Corporation
- Masafumi Hori
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern-forming method, and composition
- Patent number 11,335,559
- Issue date May 17, 2022
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 11,211,246
- Issue date Dec 28, 2021
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Radiation-sensitive composition, pattern-forming method and radiati...
- Patent number 11,204,552
- Issue date Dec 21, 2021
- JSR Corporation
- Tomoki Nagai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method and composition for selectively modifying base material surface
- Patent number 10,950,438
- Issue date Mar 16, 2021
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-forming method
- Patent number 10,725,376
- Issue date Jul 28, 2020
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method and composition
- Patent number 10,691,019
- Issue date Jun 23, 2020
- JSR Corporation
- Hiroyuki Komatsu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method
- Patent number 10,520,815
- Issue date Dec 31, 2019
- JSR Corporation
- Takehiko Naruoka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 10,146,130
- Issue date Dec 4, 2018
- JSR Corporation
- Hiroyuki Komatsu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 10,120,282
- Issue date Nov 6, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist-pattern-forming method and chemically amplified resist material
- Patent number 10,073,348
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material, pattern-forming method, compo...
- Patent number 10,073,349
- Issue date Sep 11, 2018
- Osaka University
- Hisashi Nakagawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 10,018,911
- Issue date Jul 10, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist material and resist pattern-forming method
- Patent number 9,989,849
- Issue date Jun 5, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,971,247
- Issue date May 15, 2018
- Osaka University
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 9,939,729
- Issue date Apr 10, 2018
- JSR Corporation
- Hisashi Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, pattern-forming method, and bloc...
- Patent number 9,738,746
- Issue date Aug 22, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for base, and directed self-assembly lithography method
- Patent number 9,690,192
- Issue date Jun 27, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,599,892
- Issue date Mar 21, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer and method for formi...
- Patent number 9,598,520
- Issue date Mar 21, 2017
- JSR Corporation
- Yuko Kiridoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,587,065
- Issue date Mar 7, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Base film-forming composition, and directed self-assembly lithograp...
- Patent number 9,557,644
- Issue date Jan 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for pattern formation, and pattern-forming method
- Patent number 9,534,135
- Issue date Jan 3, 2017
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method
- Patent number 9,487,868
- Issue date Nov 8, 2016
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,722,306
- Issue date May 13, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method
- Patent number 8,703,395
- Issue date Apr 22, 2014
- JSR Corporation
- Hayato Namai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 8,697,331
- Issue date Apr 15, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, fluorine-containing polymer, radiation-sensitive resin co...
- Patent number 8,530,692
- Issue date Sep 10, 2013
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20210166935
- Publication date Jun 3, 2021
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION
- Publication number 20200357633
- Publication date Nov 12, 2020
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
- Publication number 20200041898
- Publication date Feb 6, 2020
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...
- Publication number 20200041902
- Publication date Feb 6, 2020
- JSR Corporation
- Tomoki NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...
- Publication number 20190310551
- Publication date Oct 10, 2019
- JSR Corporation
- Shinya MINEGISHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20190243244
- Publication date Aug 8, 2019
- JSR Corporation
- Tetsurou KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FILM FORMATION, FILM-FORMING METHOD AND DIRECTED SE...
- Publication number 20190233561
- Publication date Aug 1, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION
- Publication number 20190235386
- Publication date Aug 1, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20190198316
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki Komatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...
- Publication number 20190194365
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki KOMATSU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE
- Publication number 20190198317
- Publication date Jun 27, 2019
- JSR Corporation
- Hiroyuki Komatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20190146340
- Publication date May 16, 2019
- JSR Corporation
- Motohiro SHIRATANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD
- Publication number 20190135967
- Publication date May 9, 2019
- JSR Corporation
- Masafumi HORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION
- Publication number 20180342387
- Publication date Nov 29, 2018
- JSR Corporation
- Hiroyuki Komatsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...
- Publication number 20180267406
- Publication date Sep 20, 2018
- JSR Corporation
- Tomoki NAGAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20180017864
- Publication date Jan 18, 2018
- JSR Corporation
- Takehiko NARUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20170299962
- Publication date Oct 19, 2017
- JSR Corporation
- Motohiro SHIRATANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITI...
- Publication number 20170269476
- Publication date Sep 21, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Publication number 20170248847
- Publication date Aug 31, 2017
- JSR Corporation
- Hiroyuki Komatsu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170184960
- Publication date Jun 29, 2017
- JSR Corporation
- Takehiko NARUOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170184961
- Publication date Jun 29, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170131634
- Publication date May 11, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170131633
- Publication date May 11, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...
- Publication number 20170088740
- Publication date Mar 30, 2017
- JSR Corporation
- Hiroyuki KOMATSU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD
- Publication number 20170075221
- Publication date Mar 16, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170075224
- Publication date Mar 16, 2017
- JSR Corporation
- Hisashi Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SE...
- Publication number 20170059992
- Publication date Mar 2, 2017
- JSR Corporation
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD
- Publication number 20170052450
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL
- Publication number 20170052448
- Publication date Feb 23, 2017
- Osaka University
- Hisashi NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...
- Publication number 20170052449
- Publication date Feb 23, 2017
- Osaka University
- HISASHI NAKAGAWA
- C07 - ORGANIC CHEMISTRY

Takehiko Naruoka

Person

Patents Grantslast 30 patents

Method and composition for selectively modifying base material surface

Composition for film formation, film-forming method and directed se...

Composition for pattern formation, and pattern-forming method

Pattern-forming method, and composition

Method and composition for selectively modifying base material surface

Radiation-sensitive composition, pattern-forming method and radiati...

Method and composition for selectively modifying base material surface

Pattern-forming method

Pattern-forming method and composition

Pattern-forming method

Composition for base, and directed self-assembly lithography method

Chemically amplified resist material and resist pattern-forming method

Resist-pattern-forming method and chemically amplified resist material

Chemically amplified resist material, pattern-forming method, compo...

Chemically amplified resist material and resist pattern-forming method

Chemically amplified resist material and resist pattern-forming method

Pattern-forming method

Resist pattern-forming method

Composition for pattern formation, pattern-forming method, and bloc...

Composition for base, and directed self-assembly lithography method

Composition for pattern formation, and pattern-forming method

Radiation-sensitive resin composition, polymer and method for formi...

Composition for pattern formation, and pattern-forming method

Base film-forming composition, and directed self-assembly lithograp...

Composition for pattern formation, and pattern-forming method

Pattern-forming method

Radiation-sensitive resin composition

Pattern-forming method

Compound, polymer, and radiation-sensitive composition

Compound, fluorine-containing polymer, radiation-sensitive resin co...

Patents Applicationslast 30 patents

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

PATTERN-FORMING METHOD, AND COMPOSITION

RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

COMPOSITION FOR FILM FORMATION, FILM-FORMING METHOD AND DIRECTED SE...

PATTERN-FORMING METHOD AND COMPOSITION

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

COMPOSITION, MODIFICATION METHOD AND SELECTIVE MODIFICATION METHOD...

METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD

PATTERN-FORMING METHOD, AND COMPOSITION

RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND RADIATI...

PATTERN-FORMING METHOD

RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD

PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITI...

COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD

PATTERN-FORMING METHOD

PATTERN-FORMING METHOD

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAP...

CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SE...

PATTERN-FORMING METHOD

RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL

CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPO...