Takehiko Orii

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas cluster processing device and gas cluster processing method
- Patent number 12,172,198
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Etching method and etching apparatus
- Patent number 11,581,192
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 11,367,630
- Issue date Jun 21, 2022
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas cluster processing device and gas cluster processing method
- Patent number 11,267,021
- Issue date Mar 8, 2022
- Tokyo Electron Limited
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon-containing film, computer-readable storag...
- Patent number 11,189,498
- Issue date Nov 30, 2021
- Tokyo Electron Limited
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 11,011,383
- Issue date May 18, 2021
- Tokyo Electron Limited
- Yasuo Asada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus, substrate cleaning system, substrate...
- Patent number 10,998,183
- Issue date May 4, 2021
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 10,835,908
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 10,811,283
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and substrate processing system
- Patent number 10,734,243
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Tsuhung Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,665,470
- Issue date May 26, 2020
- Tokyo Electron Limited
- Yasuo Asada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure container, substrate processing apparatus, and method...
- Patent number 10,207,349
- Issue date Feb 19, 2019
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 10,199,240
- Issue date Feb 5, 2019
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Separation and regeneration apparatus and substrate processing appa...
- Patent number 10,115,609
- Issue date Oct 30, 2018
- Tokyo Electron Limited
- Kazuyuki Mitsuoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and storage medium
- Patent number 10,096,462
- Issue date Oct 9, 2018
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, fluid...
- Patent number 10,046,370
- Issue date Aug 14, 2018
- Tokyo Electron Limited
- Gentaro Goshi
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 10,043,652
- Issue date Aug 7, 2018
- Tokyo Electron Limited
- Miyako Kaneko
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 9,953,826
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus having nozzle with multiple f...
- Patent number 9,922,849
- Issue date Mar 20, 2018
- Tokyo Electron Limited
- Yasuyuki Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 9,881,784
- Issue date Jan 30, 2018
- Tokyo Electron Limited
- Hiroki Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning system
- Patent number 9,799,538
- Issue date Oct 24, 2017
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, fluid...
- Patent number 9,662,685
- Issue date May 30, 2017
- Tokyo Electron Limited
- Gentaro Goshi
- B08 - CLEANING
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 9,583,330
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Linan Ji
- F26 - DRYING
Information Patent Grant
Substrate cleaning method and substrate cleaning system
- Patent number 9,443,712
- Issue date Sep 13, 2016
- Tokyo Electron Limited
- Miyako Kaneko
- B08 - CLEANING
Information Patent Grant
Apparatus for polishing rear surface of substrate, system for polis...
- Patent number 9,095,953
- Issue date Aug 4, 2015
- Tokyo Electron Limited
- Mitsunori Nakamori
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,978,671
- Issue date Mar 17, 2015
- Tokyo Electron Limited
- Satoru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, etching apparatus and storage medium
- Patent number 8,969,218
- Issue date Mar 3, 2015
- Tokyo Electron Limited
- Tsukasa Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,794,250
- Issue date Aug 5, 2014
- Tokyo Electron Limited
- Takehiko Orii
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 8,771,429
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Linan Ji
- F26 - DRYING
Information Patent Grant
Semiconductor manufacturing apparatus and semiconductor manufacturi...
- Patent number 8,770,138
- Issue date Jul 8, 2014
- Tokyo Electron Limited
- Kenichi Hara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ETCHING METHOD AND ETCHING DEVICE
- Publication number 20230223270
- Publication date Jul 13, 2023
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20220277968
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD
- Publication number 20220143655
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Kazuya DOBASHI
- B08 - CLEANING
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20210305056
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gas Cluster Processing Device and Gas Cluster Processing Method
- Publication number 20210107041
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kazuya DOBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND APPARATUS
- Publication number 20200395219
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Kazuhito MIYATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20200395230
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method and Etching Apparatus
- Publication number 20200234974
- Publication date Jul 23, 2020
- TOKYO ELECTRON LIMITED
- Yasuo ASADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON-CONTAINING FILM, COMPUTER-READABLE STORAG...
- Publication number 20190355589
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Takehiko ORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method
- Publication number 20190228981
- Publication date Jul 25, 2019
- TOKYO ELECTRON LIMITED
- Yasuo ASADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method and Etching Apparatus
- Publication number 20190221440
- Publication date Jul 18, 2019
- TOKYO ELECTRON LIMITED
- Yasuo ASADA
- B08 - CLEANING
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190198349
- Publication date Jun 27, 2019
- TOKYO ELECTRON LIMITED
- Yasuo ASADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY...
- Publication number 20190030558
- Publication date Jan 31, 2019
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20180264492
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ETCHING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20180166295
- Publication date Jun 14, 2018
- Tsuhung HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID...
- Publication number 20170320107
- Publication date Nov 9, 2017
- TOKYO ELECTRON LIMITED
- Gentaro GOSHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE...
- Publication number 20160163534
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20160118242
- Publication date Apr 28, 2016
- TOKYO ELECTRON LIMITED
- Hiroki Ohno
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20150318183
- Publication date Nov 5, 2015
- TOKYO ELECTRON LIMITED
- Yasuyuki Ido
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...
- Publication number 20150258466
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...
- Publication number 20150258465
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...
- Publication number 20150258584
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20150128995
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20150128994
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY...
- Publication number 20150064910
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...
- Publication number 20150064911
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...
- Publication number 20140261570
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Takehiko Orii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20140250714
- Publication date Sep 11, 2014
- Kabushiki Kaisha Toshiba
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-PRESSURE CONTAINER, SUBSTRATE PROCESSING APPARATUS, AND METHOD...
- Publication number 20140145390
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Kazuyuki Mitsuoka
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM
- Publication number 20140144464
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B08 - CLEANING

Takehiko Orii

Person

Patents Grantslast 30 patents

Gas cluster processing device and gas cluster processing method

Etching method and etching apparatus

Substrate cleaning method, substrate cleaning system, and memory me...

Gas cluster processing device and gas cluster processing method

Method of etching silicon-containing film, computer-readable storag...

Etching method

Substrate cleaning apparatus, substrate cleaning system, substrate...

Substrate processing method

Substrate cleaning method, substrate cleaning system, and memory me...

Etching method and substrate processing system

Etching method and etching apparatus

High-pressure container, substrate processing apparatus, and method...

Substrate processing method, substrate processing apparatus, and st...

Separation and regeneration apparatus and substrate processing appa...

Substrate processing method and storage medium

Substrate processing apparatus, substrate processing method, fluid...

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate liquid processing apparatus having nozzle with multiple f...

Substrate processing method, substrate processing apparatus, and st...

Substrate cleaning system

Substrate processing apparatus, substrate processing method, fluid...

Supercritical drying method for semiconductor substrate and supercr...

Substrate cleaning method and substrate cleaning system

Apparatus for polishing rear surface of substrate, system for polis...

Substrate processing method and substrate processing apparatus

Etching method, etching apparatus and storage medium

Substrate processing method and substrate processing apparatus

Supercritical drying method for semiconductor substrate and supercr...

Semiconductor manufacturing apparatus and semiconductor manufacturi...

Patents Applicationslast 30 patents

ETCHING METHOD AND ETCHING DEVICE

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD

ETCHING METHOD AND ETCHING APPARATUS

Gas Cluster Processing Device and Gas Cluster Processing Method

ETCHING METHOD AND APPARATUS

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

Etching Method and Etching Apparatus

METHOD OF ETCHING SILICON-CONTAINING FILM, COMPUTER-READABLE STORAG...

Etching Method

Etching Method and Etching Apparatus

ETCHING METHOD AND ETCHING APPARATUS

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY...

SUBSTRATE PROCESSING METHOD

ETCHING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, FLUID...

SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...

SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...

SEPARATION AND REGENERATION APPARATUS AND SUBSTRATE PROCESSING APPA...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...

SUBSTRATE LIQUID PROCESSING METHOD, SUBSTRATE LIQUID PROCESSING APP...

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

HIGH-PRESSURE CONTAINER, SUBSTRATE PROCESSING APPARATUS, AND METHOD...

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM