Takehiro Tanikawa

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 11,984,300
- Issue date May 14, 2024
- Tokyo Electron Limited
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,978,614
- Issue date May 7, 2024
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,869,750
- Issue date Jan 9, 2024
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method and substrate processing apparatus
- Patent number 11,264,260
- Issue date Mar 1, 2022
- Tokyo Electron Limited
- Takehiro Tanikawa
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 11,257,691
- Issue date Feb 22, 2022
- Tokyo Electron Limited
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,923,328
- Issue date Feb 16, 2021
- Tokyo Electron Limited
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for driving member and processing apparatus
- Patent number 10,825,662
- Issue date Nov 3, 2020
- Tokyo Electron Limited
- Rumiko Moriya
- G01 - MEASURING TESTING
Information Patent Grant
Method of controlling adherence of microparticles to substrate to b...
- Patent number 9,892,951
- Issue date Feb 13, 2018
- Tokyo Electron Limited
- Takehiro Tanikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing base body to be processed
- Patent number 9,728,417
- Issue date Aug 8, 2017
- Tokyo Electron Limited
- Masaki Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Antenna, dielectric window, plasma processing apparatus and plasma...
- Patent number 9,595,425
- Issue date Mar 14, 2017
- Tokyo Electron Limited
- Naoki Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,111,726
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric window for plasma treatment device, and plasma treatment...
- Patent number 9,048,070
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240030003
- Publication date Jan 25, 2024
- TOKYO ELECTRON LIMITED
- Torai IWASA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD AND PROCESSING APPARATUS
- Publication number 20230282457
- Publication date Sep 7, 2023
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ABNORMAL DISCHARGE CONTROL METHOD
- Publication number 20230060329
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220148902
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- B08 - CLEANING
Information Patent Application
STAGE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE ATTRACTION METHOD
- Publication number 20220084800
- Publication date Mar 17, 2022
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210272779
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Yusuke HAYASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20210020416
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Rumiko MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20200402775
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20200373130
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DRIVING MEMBER AND PROCESSING APPARATUS
- Publication number 20190355557
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Rumiko MORIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190348315
- Publication date Nov 14, 2019
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20190333785
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20180374682
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Takehiro TANIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ADHERENCE OF MICROPARTICLES TO SUBSTRATE TO B...
- Publication number 20150075566
- Publication date Mar 19, 2015
- TOKYO ELECTRON LIMITED
- Takehiro Tanikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING BASE BODY TO BE PROCESSED
- Publication number 20150017811
- Publication date Jan 15, 2015
- Masaki Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...
- Publication number 20140312767
- Publication date Oct 23, 2014
- TOKYO ELECTRON LIMITED
- Caizhong Tian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA...
- Publication number 20130008607
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120267048
- Publication date Oct 25, 2012
- TOKYO ELECTRON LIMITED
- Kazuki Moyama
- H01 - BASIC ELECTRIC ELEMENTS

Takehiro Tanikawa

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Substrate processing apparatus

Plasma processing apparatus

Cleaning method and substrate processing apparatus

Substrate processing apparatus

Plasma processing method and plasma processing apparatus

Method for driving member and processing apparatus

Method of controlling adherence of microparticles to substrate to b...

Method for processing base body to be processed

Antenna, dielectric window, plasma processing apparatus and plasma...

Plasma processing apparatus

Dielectric window for plasma treatment device, and plasma treatment...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

DEPOSITION METHOD AND PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND ABNORMAL DISCHARGE CONTROL METHOD

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

STAGE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE ATTRACTION METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

METHOD FOR DRIVING MEMBER AND PROCESSING APPARATUS

CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF CONTROLLING ADHERENCE OF MICROPARTICLES TO SUBSTRATE TO B...

METHOD FOR PROCESSING BASE BODY TO BE PROCESSED

DIELECTRIC WINDOW FOR PLASMA TREATMENT DEVICE, AND PLASMA TREATMENT...

ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA...

PLASMA PROCESSING APPARATUS