Takehisa SAITO

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,340,975
- Issue date Jun 24, 2025
- Tokyo Electron Limited
- Takehisa Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,832,373
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,470,712
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and film formation method
- Patent number 9,765,430
- Issue date Sep 19, 2017
- Tokyo Electron Limited
- Takehisa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wiring structure having interlayer insulating film and wiring line...
- Patent number 9,543,191
- Issue date Jan 10, 2017
- Zeon Corporation
- Takenao Nemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 9,378,942
- Issue date Jun 28, 2016
- Tokyo Electron Limited
- Takehisa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 9,343,270
- Issue date May 17, 2016
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240049379
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230021588
- Publication date Jan 26, 2023
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANTENNA FOR INDUCTIVELY COUPLED PLASMA EXCITATION, ANTENNA UNIT FOR...
- Publication number 20220270851
- Publication date Aug 25, 2022
- TOKYO ELECTRON LIMITED
- Takehisa SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING COIL
- Publication number 20220108871
- Publication date Apr 7, 2022
- TOKYO ELECTRON LIMITED
- Yohei Yamazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220005672
- Publication date Jan 6, 2022
- TOKYO ELECTRON LIMITED
- Takehisa SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190098740
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS AND FILM FORMATION METHOD
- Publication number 20170009338
- Publication date Jan 12, 2017
- TOKYO ELECTRON LIMITED
- Takehisa SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...
- Publication number 20150255258
- Publication date Sep 10, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150176125
- Publication date Jun 25, 2015
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR-DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20150041983
- Publication date Feb 12, 2015
- TOKYO ELECTRON LIMITED
- Takenao Nemoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140238607
- Publication date Aug 28, 2014
- TOKYO ELECTRON LIMITED
- Toshihisa NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20140099734
- Publication date Apr 10, 2014
- TOKYO ELECTRON LIMITED
- Takehisa SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takehisa SAITO

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and film formation method

Wiring structure having interlayer insulating film and wiring line...

Deposition method and deposition apparatus

Plasma processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

ANTENNA FOR INDUCTIVELY COUPLED PLASMA EXCITATION, ANTENNA UNIT FOR...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING COIL

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND FILM FORMATION METHOD

PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS PROV...

SUBSTRATE PROCESSING APPARATUS

SEMICONDUCTOR-DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE

PLASMA PROCESSING APPARATUS

DEPOSITION METHOD AND DEPOSITION APPARATUS