Takenori Narita

Person

Hitachi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Slurry, polishing fluid set, polishing fluid, and substrate polishi...
- Patent number 10,703,947
- Issue date Jul 7, 2020
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing liquid set, polishing liquid, method for polishin...
- Patent number 9,988,573
- Issue date Jun 5, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
Slurry, polishing fluid set, polishing fluid, and substrate polishi...
- Patent number 9,982,177
- Issue date May 29, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro Iwano
- B24 - GRINDING POLISHING
Information Patent Grant
CPM slurry for silicon film polishing and polishing method
- Patent number 8,778,803
- Issue date Jul 15, 2014
- Hitachi Chemical Company, Ltd.
- Takenori Narita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polishing agent, concentrated one-pack type polishing agent, two-pa...
- Patent number 8,728,341
- Issue date May 20, 2014
- Hitachi Chemical Company, Ltd.
- Daisuke Ryuzaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate for evaluation
- Patent number 7,554,199
- Issue date Jun 30, 2009
- Consortium for Advanced Semiconductor Materials and Related Technologies
- Takenori Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low dielectric resin composition
- Patent number 5,905,117
- Issue date May 18, 1999
- Asahi Glass Company Ltd.
- Shunsuke Yokotsuka
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...
- Publication number 20180251664
- Publication date Sep 6, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro IWANO
- B24 - GRINDING POLISHING
Information Patent Application
SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...
- Publication number 20180251680
- Publication date Sep 6, 2018
- Hitachi Chemical Company, Ltd.
- Tomohiro IWANO
- B24 - GRINDING POLISHING
Information Patent Application
SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...
- Publication number 20130244431
- Publication date Sep 19, 2013
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...
- Publication number 20130143404
- Publication date Jun 6, 2013
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...
- Publication number 20130130501
- Publication date May 23, 2013
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...
- Publication number 20120329370
- Publication date Dec 27, 2012
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...
- Publication number 20120322346
- Publication date Dec 20, 2012
- Tomohiro Iwano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING AGENT, CONCENTRATED ONE-PACK TYPE POLISHING AGENT, TWO-PA...
- Publication number 20120129346
- Publication date May 24, 2012
- Daisuke Ryuzaki
- B24 - GRINDING POLISHING
Information Patent Application
CMP SLURRY FOR SILICON FILM
- Publication number 20100001229
- Publication date Jan 7, 2010
- HITACHI CHEMICAL CO., LTD.
- Hiroshi Nakagawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Substrate for evaluation
- Publication number 20070117386
- Publication date May 24, 2007
- Consortium for Advanced Semiconductor Materials and Related Technologies
- Takenori Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Composition, methods for forming low-permittivity film using the co...
- Publication number 20060199021
- Publication date Sep 7, 2006
- Takenori Narita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Composition, methods for forming low-permittivity film using the co...
- Publication number 20040253462
- Publication date Dec 16, 2004
- HITACHI CHEMICAL CO., Ltd.
- Takenori Narita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takenori Narita

Person

Patents Grantslast 30 patents

Slurry, polishing fluid set, polishing fluid, and substrate polishi...

Slurry, polishing liquid set, polishing liquid, method for polishin...

Slurry, polishing fluid set, polishing fluid, and substrate polishi...

CPM slurry for silicon film polishing and polishing method

Polishing agent, concentrated one-pack type polishing agent, two-pa...

Substrate for evaluation

Low dielectric resin composition

Patents Applicationslast 30 patents

SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...

SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...

SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...

SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...

SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...

SLURRY, POLISHING LIQUID SET, POLISHING LIQUID, METHOD FOR POLISHIN...

SLURRY, POLISHING FLUID SET, POLISHING FLUID, AND SUBSTRATE POLISHI...

POLISHING AGENT, CONCENTRATED ONE-PACK TYPE POLISHING AGENT, TWO-PA...

CMP SLURRY FOR SILICON FILM

Substrate for evaluation

Composition, methods for forming low-permittivity film using the co...

Composition, methods for forming low-permittivity film using the co...