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Exposure system
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Patent number 5,227,838
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Issue date Jul 13, 1993
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Matsushita Electric Industrial Co., Ltd.
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Yoshito Nakanishi
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Compact reticle/wafer alignment system
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Patent number 5,194,744
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Issue date Mar 16, 1993
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Matsushita Electric Industrial Co., Ltd.
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Shinichiro Aoki
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Optical alignment detection apparatus
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Patent number 5,155,557
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Issue date Oct 13, 1992
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Matsushita Electric Industrial Co., Ltd.
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Toshiyuki Iwazawa
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Apparatus for evaluating a lens
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Patent number 5,062,705
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Issue date Nov 5, 1991
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Matsushita Electric Industrial Co., Ltd.
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Takeo Sato
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Optical projection system
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Patent number 4,948,238
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Issue date Aug 14, 1990
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Matsushita Electric Industrial Co., Ltd.
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Nobuhiro Araki
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G02 - OPTICS
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Scanning type projection exposure system
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Patent number 4,844,568
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Issue date Jul 4, 1989
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Matsushita Electric Industrial Co., Ltd.
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Masaki Suzuki
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Projection optical system
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Patent number 4,757,354
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Issue date Jul 12, 1988
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Matsushita Electrical Industrial Co., Ltd.
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Takeo Sato
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G02 - OPTICS
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