Takeo SHIOYA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,681,222
- Issue date Jun 20, 2023
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,036,133
- Issue date Jun 15, 2021
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,620,534
- Issue date Apr 14, 2020
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,082,733
- Issue date Sep 25, 2018
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,500,950
- Issue date Nov 22, 2016
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for resist pattern-refinement, and fine pattern-forming...
- Patent number 9,354,523
- Issue date May 31, 2016
- JSR Corporation
- Yuuko Kiridoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,213,236
- Issue date Dec 15, 2015
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Double patterning method
- Patent number 8,927,200
- Issue date Jan 6, 2015
- JSR Corporation
- Kanako Meya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 8,697,343
- Issue date Apr 15, 2014
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist pattern formation method
- Patent number 6,403,288
- Issue date Jun 11, 2002
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,337,171
- Issue date Jan 8, 2002
- JSR Corporation
- Eiichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20220137508
- Publication date May 5, 2022
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20210278764
- Publication date Sep 9, 2021
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20200124961
- Publication date Apr 23, 2020
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190278175
- Publication date Sep 12, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190025695
- Publication date Jan 24, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20170199453
- Publication date Jul 13, 2017
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20160062237
- Publication date Mar 3, 2016
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMI...
- Publication number 20160011513
- Publication date Jan 14, 2016
- JSR Corporation
- Yuuko Kiridoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20140162190
- Publication date Jun 12, 2014
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DOUBLE PATTERNING METHOD
- Publication number 20140080066
- Publication date Mar 20, 2014
- JSR Corporation
- Kanako MEYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20090202945
- Publication date Aug 13, 2009
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takeo SHIOYA

Person

Patents Grantslast 30 patents

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Composition for resist pattern-refinement, and fine pattern-forming...

Fluorine-containing polymer, purification method, and radiation-sen...

Double patterning method

Fluorine-containing polymer, purification method, and radiation-sen...

Resist pattern formation method

Radiation-sensitive resin composition

Patents Applicationslast 30 patents

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMI...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

DOUBLE PATTERNING METHOD

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...