Takeo Watanabe

Person

Hyogo-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pellicle comprising graphite thin film
- Patent number 11,372,326
- Issue date Jun 28, 2022
- Kaneka Corporation
- Yuki Kawashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for electron beam or EUV
- Patent number 7,879,528
- Issue date Feb 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive resin, and photosensitive composition
- Patent number 7,858,287
- Issue date Dec 28, 2010
- Hyogo Prefecture
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for electron beam or EUV (extreme ultraviolet) a...
- Patent number 7,736,842
- Issue date Jun 15, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition for electron beam or EUV
- Patent number 7,407,734
- Issue date Aug 5, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE COMPRISING GRAPHITE THIN FILM
- Publication number 20200401038
- Publication date Dec 24, 2020
- Kaneka Corporation
- Yuki Kawashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION
- Publication number 20090142697
- Publication date Jun 4, 2009
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME,...
- Publication number 20090042123
- Publication date Feb 12, 2009
- Idemitsu Kosan Co., Ltd.
- Hiroo Kinoshita
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR ELECTRON BEAM OR EUV
- Publication number 20080176170
- Publication date Jul 24, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist polymer having nano-smoothness and etching resistance,...
- Publication number 20080160449
- Publication date Jul 3, 2008
- LION CORPORATION
- Yoshiyasu Kubo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) a...
- Publication number 20070269744
- Publication date Nov 22, 2007
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition for electron beam or euv
- Publication number 20070077512
- Publication date Apr 5, 2007
- Takeo Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takeo Watanabe

Person

Patents Grantslast 30 patents

Pellicle comprising graphite thin film

Resist composition for electron beam or EUV

Photosensitive resin, and photosensitive composition

Resist composition for electron beam or EUV (extreme ultraviolet) a...

Resist composition for electron beam or EUV

Patents Applicationslast 30 patents

PELLICLE COMPRISING GRAPHITE THIN FILM

PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION

CALIXRESORCINARENE COMPOUND, PHOTORESIST BASE COMPRISING THE SAME,...

RESIST COMPOSITION FOR ELECTRON BEAM OR EUV

Photoresist polymer having nano-smoothness and etching resistance,...

Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) a...

Resist composition for electron beam or euv