Takeru KINOSHITA

Person

Chiyoda-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank for EUV lithography, and reflective layer-coa...
- Patent number 9,261,773
- Issue date Feb 16, 2016
- Asahi Glass Company, Limited
- Takeru Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography, and process for its prod...
- Patent number 9,207,529
- Issue date Dec 8, 2015
- Asahi Glass Company, Limited
- Takeru Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Glass substrate-holding tool and method for producing an EUV mask b...
- Patent number 8,967,608
- Issue date Mar 3, 2015
- Asahi Glass Company, Limited
- Takahiro Mitsumori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Glass substrate-holding tool and method for producing an EUV mask b...
- Patent number 8,837,108
- Issue date Sep 16, 2014
- Asahi Glass Company, Limited
- Takahiro Mitsumori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with reflective layer for EUV lithography and reflective...
- Patent number 8,828,626
- Issue date Sep 9, 2014
- Asahi Glass Company, Limited
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank for EUV lithography and reflective mask for E...
- Patent number 8,105,735
- Issue date Jan 31, 2012
- Asahi Glass Company, Limited
- Takeru Kinoshita
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective mask blank having a programmed defect and method of prod...
- Patent number 7,282,305
- Issue date Oct 16, 2007
- Hoya Corporation
- Tsutomo Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing a reflection type mask blank and method of...
- Patent number 7,056,627
- Issue date Jun 6, 2006
- Hoya Corporation
- Tsutomu Shoki
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND REFLECTIVE LAYER-COA...
- Publication number 20140234756
- Publication date Aug 21, 2014
- Asahi Glass Company, Limited
- Takeru KINOSHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS PROD...
- Publication number 20140186752
- Publication date Jul 3, 2014
- Asahi Glass Company, Limited
- Takeru KINOSHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH REFLECTIVE LAYER FOR EUV LITHOGRAPHY AND REFLECTIVE...
- Publication number 20130115547
- Publication date May 9, 2013
- ASAHI GLASS COMPANY, LIMITED
- Masaki Mikami
- B82 - NANO-TECHNOLOGY
Information Patent Application
GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...
- Publication number 20120321999
- Publication date Dec 20, 2012
- Asahi Glass Company, Limited
- Takahiro MITSUMORI
- B82 - NANO-TECHNOLOGY
Information Patent Application
GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...
- Publication number 20120183683
- Publication date Jul 19, 2012
- Asahi Glass Company, Limited
- Takahiro MITSUMORI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20110266140
- Publication date Nov 3, 2011
- ASAHI GLASS COMPANY LIMITED
- Takeru KINOSHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND REFLECTIVE MASK FOR E...
- Publication number 20100330470
- Publication date Dec 30, 2010
- ASAHI GLASS COMPANY, LIMITED
- Takeru KINOSHITA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Substrate with a multilayer reflection film, reflection type mask b...
- Publication number 20050238922
- Publication date Oct 27, 2005
- Hoya Corporation
- Takeru Kinoshita
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of manufacturing a reflection type mask blank and method of...
- Publication number 20050100797
- Publication date May 12, 2005
- Hoya Corporation
- Tsutomu Shoki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflective mask blank having a programmed defect and method of prod...
- Publication number 20040175633
- Publication date Sep 9, 2004
- Hoya Corporation
- Tsutomo Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takeru KINOSHITA

Person

Patents Grantslast 30 patents

Reflective mask blank for EUV lithography, and reflective layer-coa...

Reflective mask blank for EUV lithography, and process for its prod...

Glass substrate-holding tool and method for producing an EUV mask b...

Glass substrate-holding tool and method for producing an EUV mask b...

Substrate with reflective layer for EUV lithography and reflective...

Reflective mask blank for EUV lithography and reflective mask for E...

Reflective mask blank having a programmed defect and method of prod...

Method of manufacturing a reflection type mask blank and method of...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND REFLECTIVE LAYER-COA...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, AND PROCESS FOR ITS PROD...

SUBSTRATE WITH REFLECTIVE LAYER FOR EUV LITHOGRAPHY AND REFLECTIVE...

GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...

GLASS SUBSTRATE-HOLDING TOOL AND METHOD FOR PRODUCING AN EUV MASK B...

PROCESS FOR PRODUCING REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND REFLECTIVE MASK FOR E...

Substrate with a multilayer reflection film, reflection type mask b...

Method of manufacturing a reflection type mask blank and method of...

Reflective mask blank having a programmed defect and method of prod...