Takeshi Akimoto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system, switching timing creation support devi...
- Patent number 11,587,763
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing apparatus
- Patent number 6,189,481
- Issue date Feb 20, 2001
- NEC Corporation
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,911,852
- Issue date Jun 15, 1999
- Sumitomo Metal Industries Limited
- Katsuo Katayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus having a protected microwave transmissi...
- Patent number 5,804,923
- Issue date Sep 8, 1998
- Sumitomo Metal Industries Limited
- Kouichi Iio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device having trench isolation regions and bit...
- Patent number 5,798,544
- Issue date Aug 25, 1998
- NEC Corporation
- Shuichi Ohya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with mechanism for lifting up the peripheral of...
- Patent number 5,677,824
- Issue date Oct 14, 1997
- NEC Corporation
- Keiichi Harashima
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for fabricating multilayer semiconductor device
- Patent number 5,668,053
- Issue date Sep 16, 1997
- NEC Corporation
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,647,912
- Issue date Jul 15, 1997
- NEC Corporation
- Takahiro Kaminishizono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus adjusted for a batch-processing of a pl...
- Patent number 5,639,309
- Issue date Jun 17, 1997
- NEC Corporation
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 5,614,025
- Issue date Mar 25, 1997
- NEC Corporation
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing system
- Patent number 5,545,258
- Issue date Aug 13, 1996
- Sumitomo Metal Industries, Ltd.
- Katsuo Katayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processing system
- Patent number 5,529,632
- Issue date Jun 25, 1996
- Sumitomo Metal Industries, Ltd.
- Katsuo Katayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two parallel plate electrode type dry etching apparatus
- Patent number 5,415,719
- Issue date May 16, 1995
- NEC Corporation
- Takeshi Akimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND MAP C...
- Publication number 20230253224
- Publication date Aug 10, 2023
- TOKYO ELECTRON LIMITED
- Takeshi AKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING APPARATUS, DATA PROCESSING SYSTEM, DATA PROCESSING...
- Publication number 20230118026
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi YONEMICHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION METHOD AND ETCHING SYSTEM
- Publication number 20220406634
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Takeshi AKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SWITCHING TIMING CREATION SUPPORT DEVI...
- Publication number 20210272772
- Publication date Sep 2, 2021
- TOKYO ELECTRON LIMITED
- Takeshi AKIMOTO
- H01 - BASIC ELECTRIC ELEMENTS

Takeshi Akimoto

Person

Patents Grantslast 30 patents

Substrate processing system, switching timing creation support devi...

Microwave plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus having a protected microwave transmissi...

Semiconductor memory device having trench isolation regions and bit...

Electrostatic chuck with mechanism for lifting up the peripheral of...

Method for fabricating multilayer semiconductor device

Plasma processing apparatus

Plasma processing apparatus adjusted for a batch-processing of a pl...

Plasma processing apparatus

Microwave plasma processing system

Microwave plasma processing system

Two parallel plate electrode type dry etching apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING METHOD, AND MAP C...

DATA PROCESSING APPARATUS, DATA PROCESSING SYSTEM, DATA PROCESSING...

INSPECTION METHOD AND ETCHING SYSTEM

SUBSTRATE PROCESSING SYSTEM, SWITCHING TIMING CREATION SUPPORT DEVI...