Takeshi Haraguchi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-column electron beam exposure apparatus and magnetic field ge...
- Patent number 8,390,201
- Issue date Mar 5, 2013
- Advantest Corp.
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron gun minimizing sublimation of electron source and electron...
- Patent number 8,330,344
- Issue date Dec 11, 2012
- Advantest Corp.
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron gun, electron beam exposure apparatus, and exposure method
- Patent number 7,919,750
- Issue date Apr 5, 2011
- Advantest Corporation
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask inspection apparatus, mask inspection method, and electron bea...
- Patent number 7,394,068
- Issue date Jul 1, 2008
- Advantest Corp.
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multibeam generating apparatus and electron beam drawing apparatus
- Patent number 6,870,310
- Issue date Mar 22, 2005
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus and electron beam deflection appar...
- Patent number 6,804,288
- Issue date Oct 12, 2004
- Advantest Corporation
- Takeshi Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam exposure apparatus using a multi-axis electron lens, fab...
- Patent number 6,787,780
- Issue date Sep 7, 2004
- Advantest Corporation
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure system and electron lens
- Patent number 6,777,694
- Issue date Aug 17, 2004
- Advantest Corporation
- Takeshi Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing system and electron beam exposur...
- Patent number 6,764,925
- Issue date Jul 20, 2004
- Advantest Corporation
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam generating apparatus and electron beam exposure appar...
- Patent number 6,727,658
- Issue date Apr 27, 2004
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-beam exposure apparatus using a multi-axis electron lens, ele...
- Patent number 6,703,624
- Issue date Mar 9, 2004
- Advantest Corporation
- Shinichi Hamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic deflector for electron beam exposure apparatus
- Patent number 6,509,568
- Issue date Jan 21, 2003
- Advantest Corporation
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charge-particle beam lithography system of blanking aperture array...
- Patent number 6,465,796
- Issue date Oct 15, 2002
- Advantest Corporation
- Takeshi Haraguchi
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Multi-column electron beam exposure apparatus and magnetic field ge...
- Publication number 20110148297
- Publication date Jun 23, 2011
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron gun and electron beam exposure apparatus
- Publication number 20100019648
- Publication date Jan 28, 2010
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron gun, electron beam exposure apparatus, and exposure method
- Publication number 20080315089
- Publication date Dec 25, 2008
- Hiroshi Yasuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron gun, electron beam exposure apparatus, and exposure method
- Publication number 20080211376
- Publication date Sep 4, 2008
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask inspection apparatus, mask inspection method, and electron bea...
- Publication number 20060076491
- Publication date Apr 13, 2006
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multibeam generating apparatus and electron beam drawing apparatus
- Publication number 20040056578
- Publication date Mar 25, 2004
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-beam exposure apparatus using a multi- axis electron lens, el...
- Publication number 20030189180
- Publication date Oct 9, 2003
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure system and electron lens
- Publication number 20030183773
- Publication date Oct 2, 2003
- Advantest Corporation
- Takeshi Haraguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposure apparatus and electron beam deflection appar...
- Publication number 20030183778
- Publication date Oct 2, 2003
- Advantest Corporation
- Takeshi Haraguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam generating apparatus and electron beam exposure appar...
- Publication number 20030155522
- Publication date Aug 21, 2003
- Advantest Corporation
- Yoshihisa Ooae
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam exposing method and exposure apparatus
- Publication number 20030071231
- Publication date Apr 17, 2003
- Takeshi Haraguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device manufacturing system and electron beam exposur...
- Publication number 20020039829
- Publication date Apr 4, 2002
- Advantest Corporation
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electrostatic deflector for electron beam exposure apparatus
- Publication number 20020020354
- Publication date Feb 21, 2002
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic deflector for electron beam exposure apparatus
- Publication number 20010045528
- Publication date Nov 29, 2001
- Yoshihisa Ooae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-beam exposure apparatus using a muti-axis electron lens, elec...
- Publication number 20010028044
- Publication date Oct 11, 2001
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-beam exposure apparatus using a multi-axis electron lens, fab...
- Publication number 20010028046
- Publication date Oct 11, 2001
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-beam exposure apparatus using a multi-axis electron lens, fab...
- Publication number 20010028038
- Publication date Oct 11, 2001
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-beam exposure apparatus using a multi-axis electron lens, ele...
- Publication number 20010028042
- Publication date Oct 11, 2001
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-beam exposure apparatus using a multi-axis electron lens, fab...
- Publication number 20010028043
- Publication date Oct 11, 2001
- Shinichi Hamaguchi
- B82 - NANO-TECHNOLOGY

Takeshi Haraguchi

Person

Patents Grantslast 30 patents

Multi-column electron beam exposure apparatus and magnetic field ge...

Electron gun minimizing sublimation of electron source and electron...

Electron gun, electron beam exposure apparatus, and exposure method

Mask inspection apparatus, mask inspection method, and electron bea...

Multibeam generating apparatus and electron beam drawing apparatus

Electron beam exposure apparatus and electron beam deflection appar...

Multi-beam exposure apparatus using a multi-axis electron lens, fab...

Electron beam exposure system and electron lens

Semiconductor device manufacturing system and electron beam exposur...

Electron beam generating apparatus and electron beam exposure appar...

Multi-beam exposure apparatus using a multi-axis electron lens, ele...

Electrostatic deflector for electron beam exposure apparatus

Charge-particle beam lithography system of blanking aperture array...

Patents Applicationslast 30 patents

Multi-column electron beam exposure apparatus and magnetic field ge...

Electron gun and electron beam exposure apparatus

Electron gun, electron beam exposure apparatus, and exposure method

Electron gun, electron beam exposure apparatus, and exposure method

Mask inspection apparatus, mask inspection method, and electron bea...

Multibeam generating apparatus and electron beam drawing apparatus

Multi-beam exposure apparatus using a multi- axis electron lens, el...

Electron beam exposure system and electron lens

Electron beam exposure apparatus and electron beam deflection appar...

Electron beam generating apparatus and electron beam exposure appar...

Electron beam exposing method and exposure apparatus

Semiconductor device manufacturing system and electron beam exposur...

Electrostatic deflector for electron beam exposure apparatus

Electrostatic deflector for electron beam exposure apparatus

Multi-beam exposure apparatus using a muti-axis electron lens, elec...

Multi-beam exposure apparatus using a multi-axis electron lens, fab...

Multi-beam exposure apparatus using a multi-axis electron lens, fab...

Multi-beam exposure apparatus using a multi-axis electron lens, ele...

Multi-beam exposure apparatus using a multi-axis electron lens, fab...