Takeshi INASAKI

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Lithographic printing plate precursor and method for producing lith...
- Patent number 11,543,750
- Issue date Jan 3, 2023
- FUJIFILM Corporation
- Keisuke Nogoshi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Lithographic printing plate precursor, and method for producing lit...
- Patent number 11,294,279
- Issue date Apr 5, 2022
- FUJIFILM Corporation
- Yohei Ishiji
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Color developing composition, lithographic printing plate precursor...
- Patent number 11,117,364
- Issue date Sep 14, 2021
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Color developing composition, lithographic printing plate precursor...
- Patent number 10,921,712
- Issue date Feb 16, 2021
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Near-infrared-ray-absorbing composition, near-infrared-ray cut filt...
- Patent number 9,826,129
- Issue date Nov 21, 2017
- FUJIFILM Corporation
- Takeshi Inasaki
- G02 - OPTICS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,563,121
- Issue date Feb 7, 2017
- FUJIFILM Corporation
- Takeshi Inasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, and resis...
- Patent number 9,285,679
- Issue date Mar 15, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative actinic ray-sensitive or radiation-sensitive resin composi...
- Patent number 9,235,120
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation sensitive resin composition, actinic-ray-...
- Patent number 9,235,116
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,223,204
- Issue date Dec 29, 2015
- FUJITSU Corporation
- Takayuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, and resist film, resist-coated mask bl...
- Patent number 9,091,927
- Issue date Jul 28, 2015
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,895,222
- Issue date Nov 25, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,735,048
- Issue date May 27, 2014
- FUJIFILM Corporation
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,673,538
- Issue date Mar 18, 2014
- FUJIFILM Corporation
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist film, resist coated mask blanks and method of forming resist...
- Patent number 8,614,033
- Issue date Dec 24, 2013
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 8,574,814
- Issue date Nov 5, 2013
- FUJIFILM Corporation
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 8,329,379
- Issue date Dec 11, 2012
- FUJIFILM Corporation
- Takayuki Ito
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PRODUCING LITH...
- Publication number 20200117086
- Publication date Apr 16, 2020
- FUJIFILM CORPORATION
- Keisuke NOGOSHI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR PRODUCING LIT...
- Publication number 20200041899
- Publication date Feb 6, 2020
- FUJIFILM CORPORATION
- Yohei ISHIJI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
COLOR DEVELOPING COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR...
- Publication number 20190184696
- Publication date Jun 20, 2019
- FUJIFILM CORPORATION
- Takeshi INASAKI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
COLOR DEVELOPING COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR...
- Publication number 20180356730
- Publication date Dec 13, 2018
- FUJIFILM CORPORATION
- Takeshi INASAKI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING PLANOGRA...
- Publication number 20180321586
- Publication date Nov 8, 2018
- FUJIFILM CORPORATION
- Takeshi INASAKI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE-MAKING METHOD
- Publication number 20180154671
- Publication date Jun 7, 2018
- FUJIFILM CORPORATION
- Takeshi INASAKI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAI...
- Publication number 20160178816
- Publication date Jun 23, 2016
- FUJIFILM CORPORATION
- Hidenori TAKAHASHI
- G02 - OPTICS
Information Patent Application
NEAR INFRARED RADIATION-ABSORBING COMPOSITION, NEAR INFRARED RADIAT...
- Publication number 20160103247
- Publication date Apr 14, 2016
- FUJIFILM CORPORATION
- Seiichi HITOMI
- G02 - OPTICS
Information Patent Application
NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT-OFF FILTER A...
- Publication number 20160077256
- Publication date Mar 17, 2016
- FUJIFILM CORPORATION
- Takashi KAWASHIMA
- G02 - OPTICS
Information Patent Application
NEAR-INFRARED-RAY-ABSORBING COMPOSITION, NEAR-INFRARED-RAY CUT FILT...
- Publication number 20160037034
- Publication date Feb 4, 2016
- FUJIFILM CORPORATION
- Takeshi INASAKI
- G02 - OPTICS
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIS...
- Publication number 20150010855
- Publication date Jan 8, 2015
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20140342275
- Publication date Nov 20, 2014
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSI...
- Publication number 20140178806
- Publication date Jun 26, 2014
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20140127627
- Publication date May 8, 2014
- Takayuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140099572
- Publication date Apr 10, 2014
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BL...
- Publication number 20140072905
- Publication date Mar 13, 2014
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, AN...
- Publication number 20130084518
- Publication date Apr 4, 2013
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20130029255
- Publication date Jan 31, 2013
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20130004888
- Publication date Jan 3, 2013
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20120301817
- Publication date Nov 29, 2012
- FUJIFILM CORPORATION
- Takeshi Inasaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST...
- Publication number 20120214091
- Publication date Aug 23, 2012
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION, AND RESIST...
- Publication number 20120202141
- Publication date Aug 9, 2012
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20100248143
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Takayuki ITO
- B82 - NANO-TECHNOLOGY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20100248149
- Publication date Sep 30, 2010
- FUJIFILM CORPORATION
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Catalyst Material For Use In Fuel Cell, Catalyst Membrane, Membrane...
- Publication number 20070231671
- Publication date Oct 4, 2007
- FUJIFILM Corporation
- Takeshi Inasaki
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Takeshi INASAKI

Person

Patents Grantslast 30 patents

Lithographic printing plate precursor and method for producing lith...

Lithographic printing plate precursor, and method for producing lit...

Color developing composition, lithographic printing plate precursor...

Color developing composition, lithographic printing plate precursor...

Near-infrared-ray-absorbing composition, near-infrared-ray cut filt...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Actinic ray-sensitive or radiation-sensitive composition, and resis...

Negative actinic ray-sensitive or radiation-sensitive resin composi...

Actinic-ray- or radiation sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Positive resist composition, and resist film, resist-coated mask bl...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Resist film, resist coated mask blanks and method of forming resist...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PRODUCING LITH...

LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR PRODUCING LIT...

COLOR DEVELOPING COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR...

COLOR DEVELOPING COMPOSITION, LITHOGRAPHIC PRINTING PLATE PRECURSOR...

PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING PLANOGRA...

PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE-MAKING METHOD

NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAI...

NEAR INFRARED RADIATION-ABSORBING COMPOSITION, NEAR INFRARED RADIAT...

NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT-OFF FILTER A...

NEAR-INFRARED-RAY-ABSORBING COMPOSITION, NEAR-INFRARED-RAY CUT FILT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, AND RESIS...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BL...

NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, AN...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST...

CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION, AND RESIST...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

Catalyst Material For Use In Fuel Cell, Catalyst Membrane, Membrane...