Takeshi Kawabata

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, heterocyclic ring-containing poly...
- Patent number 11,860,538
- Issue date Jan 2, 2024
- FUJIFILM Corporation
- Takeshi Kawabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, polymer precursor, cured film, la...
- Patent number 11,567,405
- Issue date Jan 31, 2023
- FUJIFILM Corporation
- Takeshi Kawabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, polymer precursor, cured film, la...
- Patent number 11,487,202
- Issue date Nov 1, 2022
- FUJIFILM Corporation
- Takeshi Kawabata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laminate, method for manufacturing laminate, semiconductor device,...
- Patent number 10,780,679
- Issue date Sep 22, 2020
- FUJIFILM Corporation
- Yu Iwai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polyimide precursor composition, photosensitive resin composition,...
- Patent number 10,538,627
- Issue date Jan 21, 2020
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Precursor composition, photosensitive resin composition, method for...
- Patent number 10,526,448
- Issue date Jan 7, 2020
- FUJIFILM Corporation
- Akinori Shibuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polyimide precursor composition, photosensitive resin composition,...
- Patent number 10,501,580
- Issue date Dec 10, 2019
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin, composition, cured film, method for manufacturing cured film...
- Patent number 10,450,417
- Issue date Oct 22, 2019
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 10,234,759
- Issue date Mar 19, 2019
- Fujifilm Corporation
- Takeshi Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,563,121
- Issue date Feb 7, 2017
- FUJIFILM Corporation
- Takeshi Inasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,557,643
- Issue date Jan 31, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,448,477
- Issue date Sep 20, 2016
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray- or radiation sensitive resin composition, actinic-ray-...
- Patent number 9,235,116
- Issue date Jan 12, 2016
- FUJIFILM Corporation
- Takeshi Inasaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, actinic r...
- Patent number 9,223,215
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Natsumi Yokokawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,152,047
- Issue date Oct 6, 2015
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray—or radiation-sensitive resin composition and method of...
- Patent number 8,962,233
- Issue date Feb 24, 2015
- FUJIFILM Corporation
- Takeshi Kawabata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition and method of...
- Patent number 8,940,471
- Issue date Jan 27, 2015
- FUJIFILM Corporation
- Takeshi Kawabata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Composition, resist film, pattern forming method, and inkjet record...
- Patent number 8,808,961
- Issue date Aug 19, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Active light ray sensitive or radioactive ray sensitive resin compo...
- Patent number 8,603,727
- Issue date Dec 10, 2013
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240201589
- Publication date Jun 20, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240192592
- Publication date Jun 13, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230161249
- Publication date May 25, 2023
- FUJIFILM CORPORATION
- Minoru Uemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230139891
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Masafumi Kojima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...
- Publication number 20220283499
- Publication date Sep 8, 2022
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...
- Publication number 20220252985
- Publication date Aug 11, 2022
- FUJIFILM CORPORATION
- Toshiaki FUKUHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210271162
- Publication date Sep 2, 2021
- FUJIFILM CORPORATION
- Keiyu OU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, POLYMER PRECURSOR, CURED FILM, LA...
- Publication number 20200089113
- Publication date Mar 19, 2020
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, HETEROCYCLIC RING-CONTAINING POLY...
- Publication number 20190369496
- Publication date Dec 5, 2019
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- B32 - LAYERED PRODUCTS
Information Patent Application
LAMINATE, METHOD FOR MANUFACTURING LAMINATE, SEMICONDUCTOR DEVICE,...
- Publication number 20180222164
- Publication date Aug 9, 2018
- FUJIFILM CORPORATION
- Yu IWAI
- B32 - LAYERED PRODUCTS
Information Patent Application
RESIN, COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM...
- Publication number 20180215874
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR...
- Publication number 20180118887
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Akinori SHIBUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYIMIDE PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION,...
- Publication number 20180079864
- Publication date Mar 22, 2018
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20150338736
- Publication date Nov 26, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150185612
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20150118628
- Publication date Apr 30, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150086912
- Publication date Mar 26, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20140349224
- Publication date Nov 27, 2014
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140349223
- Publication date Nov 27, 2014
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20140342275
- Publication date Nov 20, 2014
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC R...
- Publication number 20140272692
- Publication date Sep 18, 2014
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20140212797
- Publication date Jul 31, 2014
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20140199617
- Publication date Jul 17, 2014
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20140099572
- Publication date Apr 10, 2014
- FUJIFILM CORPORATION
- Takeshi INASAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTER...
- Publication number 20120100481
- Publication date Apr 26, 2012
- FUJIFILM CORPORATION
- Takayuki Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20120082939
- Publication date Apr 5, 2012
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...
- Publication number 20120003590
- Publication date Jan 5, 2012
- FUJIFILM CORPORATION
- Shuji HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN F...
- Publication number 20110318691
- Publication date Dec 29, 2011
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST F...
- Publication number 20110318693
- Publication date Dec 29, 2011
- FUJIFILM CORPORATION
- Hidenori TAKAHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takeshi Kawabata

Person

Patents Grantslast 30 patents

Photosensitive resin composition, heterocyclic ring-containing poly...

Photosensitive resin composition, polymer precursor, cured film, la...

Photosensitive resin composition, polymer precursor, cured film, la...

Laminate, method for manufacturing laminate, semiconductor device,...

Polyimide precursor composition, photosensitive resin composition,...

Precursor composition, photosensitive resin composition, method for...

Polyimide precursor composition, photosensitive resin composition,...

Resin, composition, cured film, method for manufacturing cured film...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic-ray- or radiation sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive composition, actinic r...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic-ray—or radiation-sensitive resin composition and method of...

Actinic-ray- or radiation-sensitive resin composition and method of...

Composition, resist film, pattern forming method, and inkjet record...

Active light ray sensitive or radioactive ray sensitive resin compo...

Patents Applicationslast 30 patents

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...

COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING MET...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOSENSITIVE RESIN COMPOSITION, POLYMER PRECURSOR, CURED FILM, LA...

PHOTOSENSITIVE RESIN COMPOSITION, HETEROCYCLIC RING-CONTAINING POLY...

LAMINATE, METHOD FOR MANUFACTURING LAMINATE, SEMICONDUCTOR DEVICE,...

RESIN, COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM...

PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR...

POLYIMIDE PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION,...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, ACTINIC R...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

ACTINIC-RAY- OR RADIATION SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTER...

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND...

RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN F...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST F...