Takeshi Kobayashi

Person

Iwate, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma generating apparatus, plasma processing apparatus, and plasm...
- Patent number 12,131,889
- Issue date Oct 29, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ignition method and plasma processing apparatus
- Patent number 12,080,517
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement system, temperature measurement method, and...
- Patent number 11,972,921
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method, plasma processing apparatus, and control...
- Patent number 11,901,158
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic drive apparatus and magnetizing method
- Patent number 11,702,746
- Issue date Jul 18, 2023
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,674,225
- Issue date Jun 13, 2023
- Tokyo Electron Limted
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate holding mechanism and substrate processing apparatus
- Patent number 11,664,201
- Issue date May 30, 2023
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotation detection jig, substrate processing apparatus and method o...
- Patent number 11,572,625
- Issue date Feb 7, 2023
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotation angle detection apparatus and rotation angle detection met...
- Patent number 11,422,008
- Issue date Aug 23, 2022
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation apparatus
- Patent number 11,136,669
- Issue date Oct 5, 2021
- TOKYO ELECTRON LIMIIED
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method
- Patent number 11,118,267
- Issue date Sep 14, 2021
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generating apparatus, plasma processing apparatus, and metho...
- Patent number 10,643,824
- Issue date May 5, 2020
- Tokyo Electron Limited
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,584,416
- Issue date Mar 10, 2020
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device and operation method
- Patent number 10,103,009
- Issue date Oct 16, 2018
- Tokyo Electron Limited
- Shigehiro Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ready for rotation state detection device, method of detecting read...
- Patent number 10,002,417
- Issue date Jun 19, 2018
- Tokyo Electron Limited
- Kiichi Takahashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Film formation device, substrate processing device, and film format...
- Patent number 9,583,312
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method, and recordin...
- Patent number 9,583,318
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing device and operation method
- Patent number 9,376,751
- Issue date Jun 28, 2016
- Tokyo Electron Limited
- Shigehiro Miura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus, substrate processing apparatus and film...
- Patent number 9,111,747
- Issue date Aug 18, 2015
- Tokyo Electron Limited
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240387144
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGNITION CONTROL METHOD, FILM FORMATION METHOD, AND SUBSTRATE PROCE...
- Publication number 20240312763
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240006163
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230402256
- Publication date Dec 14, 2023
- TOKYO ELECTRON LIMITED
- Takashi CHIBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IGNITION CONTROL METHOD, FILM FORMING METHOD, AND FILM FORMING APPA...
- Publication number 20230235460
- Publication date Jul 27, 2023
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING...
- Publication number 20230129976
- Publication date Apr 27, 2023
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD
- Publication number 20230053083
- Publication date Feb 16, 2023
- TOKYO ELECTRON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IGNITION METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220293394
- Publication date Sep 15, 2022
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING ROTARY TABLE AND PROCESSING APPARATUS
- Publication number 20220275508
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASM...
- Publication number 20220122812
- Publication date Apr 21, 2022
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND CONTROL...
- Publication number 20210351010
- Publication date Nov 11, 2021
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210351005
- Publication date Nov 11, 2021
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HOLDING MECHANISM AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210249235
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEMPERATURE MEASUREMENT SYSTEM, TEMPERATURE MEASUREMENT METHOD, AND...
- Publication number 20210151285
- Publication date May 20, 2021
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- G01 - MEASURING TESTING
Information Patent Application
MAGNETIC DRIVE APPARATUS, MAGNETIZING METHOD, AND METHOD OF MANUFAC...
- Publication number 20200370176
- Publication date Nov 26, 2020
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rotation Angle Detection Apparatus and Rotation Angle Detection Met...
- Publication number 20200116528
- Publication date Apr 16, 2020
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190360093
- Publication date Nov 28, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Formation Apparatus
- Publication number 20190186004
- Publication date Jun 20, 2019
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ROTATION DETECTION JIG, SUBSTRATE PROCESSING APPARATUS AND METHOD O...
- Publication number 20180251892
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus
- Publication number 20180195173
- Publication date Jul 12, 2018
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, AND METHO...
- Publication number 20180096826
- Publication date Apr 5, 2018
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Antenna Device, Plasma Generating Device Using the Same, and Plasma...
- Publication number 20180073146
- Publication date Mar 15, 2018
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20170218514
- Publication date Aug 3, 2017
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND RECORDIN...
- Publication number 20160293390
- Publication date Oct 6, 2016
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND OPERATION METHOD
- Publication number 20160268105
- Publication date Sep 15, 2016
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE AND OPERATION METHOD
- Publication number 20150235813
- Publication date Aug 20, 2015
- TOKYO ELECTRON LIMITED
- Shigehiro MIURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE EJECTION DETECTION DEVICE, METHOD OF DETECTING SUBSTRATE...
- Publication number 20140345523
- Publication date Nov 27, 2014
- TOKYO ELECTRON LIMITED
- Hitoshi KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
READY FOR ROTATION STATE DETECTION DEVICE, METHOD OF DETECTING READ...
- Publication number 20140347465
- Publication date Nov 27, 2014
- TOKYO ELECTRON LIMITED
- Kiichi TAKAHASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF DEPOSITING A FILM
- Publication number 20140220260
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Jun Yamawaku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION DEVICE, SUBSTRATE PROCESSING DEVICE, AND FILM FORMAT...
- Publication number 20140170859
- Publication date Jun 19, 2014
- TOKYO ELECTRON LIMITED
- Jun YAMAWAKU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takeshi Kobayashi

Person

Patents Grantslast 30 patents

Plasma generating apparatus, plasma processing apparatus, and plasm...

Ignition method and plasma processing apparatus

Temperature measurement system, temperature measurement method, and...

Plasma processing method, plasma processing apparatus, and control...

Magnetic drive apparatus and magnetizing method

Substrate processing apparatus

Substrate holding mechanism and substrate processing apparatus

Rotation detection jig, substrate processing apparatus and method o...

Rotation angle detection apparatus and rotation angle detection met...

Film formation apparatus

Substrate processing method

Plasma generating apparatus, plasma processing apparatus, and metho...

Substrate processing apparatus

Plasma processing device and operation method

Ready for rotation state detection device, method of detecting read...

Film formation device, substrate processing device, and film format...

Plasma processing apparatus, plasma processing method, and recordin...

Plasma processing device and operation method

Film deposition apparatus, substrate processing apparatus and film...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

IGNITION CONTROL METHOD, FILM FORMATION METHOD, AND SUBSTRATE PROCE...

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

IGNITION CONTROL METHOD, FILM FORMING METHOD, AND FILM FORMING APPA...

IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING...

PLASMA PROCESSING APPARATUS AND FILM FORMING METHOD

IGNITION METHOD AND PLASMA PROCESSING APPARATUS

METHOD OF CONTROLLING ROTARY TABLE AND PROCESSING APPARATUS

PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, AND PLASM...

PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND CONTROL...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE HOLDING MECHANISM AND SUBSTRATE PROCESSING APPARATUS

TEMPERATURE MEASUREMENT SYSTEM, TEMPERATURE MEASUREMENT METHOD, AND...

MAGNETIC DRIVE APPARATUS, MAGNETIZING METHOD, AND METHOD OF MANUFAC...

Rotation Angle Detection Apparatus and Rotation Angle Detection Met...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Film Formation Apparatus

ROTATION DETECTION JIG, SUBSTRATE PROCESSING APPARATUS AND METHOD O...

Substrate Processing Apparatus

PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, AND METHO...

Antenna Device, Plasma Generating Device Using the Same, and Plasma...

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND RECORDIN...

PLASMA PROCESSING DEVICE AND OPERATION METHOD

PLASMA PROCESSING DEVICE AND OPERATION METHOD

SUBSTRATE EJECTION DETECTION DEVICE, METHOD OF DETECTING SUBSTRATE...

READY FOR ROTATION STATE DETECTION DEVICE, METHOD OF DETECTING READ...

SUBSTRATE PROCESSING APPARATUS AND METHOD OF DEPOSITING A FILM

FILM FORMATION DEVICE, SUBSTRATE PROCESSING DEVICE, AND FILM FORMAT...