Takeshi Koshiba

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming pattern, system for calculating resist coating di...
- Patent number 9,389,513
- Issue date Jul 12, 2016
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern forming method
- Patent number 9,381,540
- Issue date Jul 5, 2016
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method
- Patent number 9,046,763
- Issue date Jun 2, 2015
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint apparatus, imprint method, and manufacturing method of semi...
- Patent number 8,907,346
- Issue date Dec 9, 2014
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acceptance determining method of blank for EUV mask and manufacturi...
- Patent number 8,423,926
- Issue date Apr 16, 2013
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method, manufacturing method of semiconductor devic...
- Patent number 8,178,366
- Issue date May 15, 2012
- Kabushiki Kaisha Toshiba
- Seiro Miyoshi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Patent number 7,985,958
- Issue date Jul 26, 2011
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Character pattern extracting method, charged particle beam drawing...
- Patent number 7,889,910
- Issue date Feb 15, 2011
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography apparatus, lithography method, lithograph...
- Patent number 7,482,604
- Issue date Jan 27, 2009
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method of character projection syste...
- Patent number 7,459,705
- Issue date Dec 2, 2008
- Kabushiki Kaisha Toshiba
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20160260643
- Publication date Sep 8, 2016
- KABUSHIKI KAISHA TOSHIBA
- Takeshi KOSHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20150224536
- Publication date Aug 13, 2015
- Kabushiki Kaisha Toshiba
- Takeshi KOSHIBA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
EXPOSURE METHOD, REFLECTION TYPE MASK, AND SEMICONDUCTOR DEVICE MAN...
- Publication number 20140349219
- Publication date Nov 27, 2014
- KABUSHIKI KAISHA TOSHIBA
- Hiroyuki MIZUNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
- Publication number 20140319700
- Publication date Oct 30, 2014
- KABUSHIKI KAISHA TOSHIBA
- Takeshi KOSHIBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...
- Publication number 20140065735
- Publication date Mar 6, 2014
- Kabushiki Kaisha Toshiba
- Takeshi Koshiba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING TEMPLATE
- Publication number 20130220970
- Publication date Aug 29, 2013
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
ACCEPTANCE DETERMINING METHOD OF BLANK FOR EUV MASK AND MANUFACTURI...
- Publication number 20120174045
- Publication date Jul 5, 2012
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMATION METHOD
- Publication number 20120009791
- Publication date Jan 12, 2012
- Yingkang ZHANG
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVIC...
- Publication number 20110300646
- Publication date Dec 8, 2011
- Seiro MIYOSHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN VERIFICATION METHOD, PATTERN GENERATING METHOD, DEVICE FABR...
- Publication number 20110194751
- Publication date Aug 11, 2011
- Michiya TAKIMOTO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FORMING PATTERN, SYSTEM FOR CALCULATING RESIST COATING DI...
- Publication number 20110189601
- Publication date Aug 4, 2011
- Takeshi KOSHIBA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN GENERATING METHOD AND PROCESS DETERMINING METHOD
- Publication number 20110143271
- Publication date Jun 16, 2011
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN TRANSFER METHOD
- Publication number 20110012297
- Publication date Jan 20, 2011
- Ayumi KOBIKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20100237045
- Publication date Sep 23, 2010
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN GENERATION METHOD, RECORDING MEDIUM, AND PATTERN FORMATION...
- Publication number 20100187714
- Publication date Jul 29, 2010
- Ayumi KOBIKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
PATTERN FORMING METHOD AND PATTERN FORMING DEVICE
- Publication number 20100029084
- Publication date Feb 4, 2010
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR FORMING PATTERN, AND TEMPLATE
- Publication number 20100022036
- Publication date Jan 28, 2010
- Ikuo YONEDA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED-BEAM EXPOSURE APPARATUS HAVING AN IMPROVED ALIGNMENT PRECIS...
- Publication number 20090206280
- Publication date Aug 20, 2009
- Takeshi KOSHIBA
- B82 - NANO-TECHNOLOGY
Information Patent Application
MICROFABRICATION APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20090095711
- Publication date Apr 16, 2009
- Takeshi Koshiba
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Charged particle beam drawing apparatus, charged particle beam draw...
- Publication number 20080001077
- Publication date Jan 3, 2008
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Character pattern extracting method, charged particle beam drawing...
- Publication number 20070263921
- Publication date Nov 15, 2007
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged particle beam exposure method of character projection syste...
- Publication number 20070114463
- Publication date May 24, 2007
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron beam lithography apparatus, lithography method, lithograph...
- Publication number 20060289805
- Publication date Dec 28, 2006
- Tetsuro Nakasugi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam drawing apparatus, deflection amplifier, deflection c...
- Publication number 20060151721
- Publication date Jul 13, 2006
- Tetsuro Nakasugi
- B82 - NANO-TECHNOLOGY

Takeshi Koshiba

Person

Patents Grantslast 30 patents

Method of forming pattern, system for calculating resist coating di...

Pattern forming method

Pattern forming method

Imprint apparatus, imprint method, and manufacturing method of semi...

Acceptance determining method of blank for EUV mask and manufacturi...

Pattern forming method, manufacturing method of semiconductor devic...

Electron beam drawing apparatus, deflection amplifier, deflection c...

Character pattern extracting method, charged particle beam drawing...

Electron beam lithography apparatus, lithography method, lithograph...

Charged particle beam exposure method of character projection syste...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PATTERN FORMING METHOD

EXPOSURE METHOD, REFLECTION TYPE MASK, AND SEMICONDUCTOR DEVICE MAN...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME

IMPRINT APPARATUS, IMPRINT METHOD, AND MANUFACTURING METHOD OF SEMI...

METHOD FOR FABRICATING TEMPLATE

ACCEPTANCE DETERMINING METHOD OF BLANK FOR EUV MASK AND MANUFACTURI...

PATTERN FORMATION METHOD

PATTERN FORMING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVIC...

PATTERN VERIFICATION METHOD, PATTERN GENERATING METHOD, DEVICE FABR...

METHOD OF FORMING PATTERN, SYSTEM FOR CALCULATING RESIST COATING DI...

PATTERN GENERATING METHOD AND PROCESS DETERMINING METHOD

PATTERN TRANSFER METHOD

PATTERN FORMING METHOD

PATTERN GENERATION METHOD, RECORDING MEDIUM, AND PATTERN FORMATION...

PATTERN FORMING METHOD AND PATTERN FORMING DEVICE

METHOD FOR FORMING PATTERN, AND TEMPLATE

CHARGED-BEAM EXPOSURE APPARATUS HAVING AN IMPROVED ALIGNMENT PRECIS...

MICROFABRICATION APPARATUS AND DEVICE MANUFACTURING METHOD

Charged particle beam drawing apparatus, charged particle beam draw...

Character pattern extracting method, charged particle beam drawing...

Charged particle beam exposure method of character projection syste...

Electron beam lithography apparatus, lithography method, lithograph...

Electron beam drawing apparatus, deflection amplifier, deflection c...