Takeshi MIYACHI

Person

Utsunomiya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Evaluation method and fabrication method of optical element having...
- Patent number 7,858,958
- Issue date Dec 28, 2010
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Evaluation method and fabrication method of optical element having...
- Patent number 7,544,960
- Issue date Jun 9, 2009
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method of manufacturing image display device and method of dividing...
- Patent number 7,510,898
- Issue date Mar 31, 2009
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light source unit, exposure apparatus, and device manufacturing method
- Patent number 7,170,579
- Issue date Jan 30, 2007
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for retaining mirror, and mirror exchange method
- Patent number 6,985,208
- Issue date Jan 10, 2006
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G02 - OPTICS
Information Patent Grant
Mask pattern magnification correction method, magnification correct...
- Patent number 6,804,323
- Issue date Oct 12, 2004
- Canon Kabushiki Kaisha
- Akira Moriya
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Exposure method, exposure apparatus and semiconductor manufacturing...
- Patent number 6,463,119
- Issue date Oct 8, 2002
- Canon Kabushiki Kaisha
- Shigeru Terashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask holding device, exposure apparatus and device manufacturing me...
- Patent number 6,381,005
- Issue date Apr 30, 2002
- Canon Kabushiki Kaisha
- Kazuyuki Kasumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask structure and method of making the same
- Patent number 6,258,492
- Issue date Jul 10, 2001
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask and X-ray exposure method using the same
- Patent number 6,101,237
- Issue date Aug 8, 2000
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray exposure apparatus
- Patent number 6,078,640
- Issue date Jun 20, 2000
- Canon Kabushiki Kaisha
- Takayuki Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask structure and mask holding mechanism for exposure apparatus
- Patent number 6,069,931
- Issue date May 30, 2000
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning exposure method and mask therefor
- Patent number 5,994,003
- Issue date Nov 30, 1999
- Canon Kabushiki Kaisha
- Shinichi Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask structure and method of making the same
- Patent number 5,861,603
- Issue date Jan 19, 1999
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask supporting device and correction method therefor, and exposure...
- Patent number 5,854,819
- Issue date Dec 29, 1998
- Canon Kabushiki Kaisha
- Shinichi Hara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of making X-ray mask structure
- Patent number 5,656,398
- Issue date Aug 12, 1997
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray exposure apparatus
- Patent number 5,600,698
- Issue date Feb 4, 1997
- Canon Kabushiki Kaisha
- Shigeru Terashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask comprising a holding frame and reinforcing member with a...
- Patent number 5,589,304
- Issue date Dec 31, 1996
- Canon Kabushiki Kaisha
- Keiko Chiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring positional deviation while corre...
- Patent number 5,585,923
- Issue date Dec 17, 1996
- Canon Kabushiki Kaisha
- Noriyuki Nose
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask, and exposure apparatus and device production using the...
- Patent number 5,485,495
- Issue date Jan 16, 1996
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask structure
- Patent number 5,356,686
- Issue date Oct 18, 1994
- Canon Kabushiki Kaisha
- Hidehiko Fujioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical modulating device having projection on substrate for regist...
- Patent number 4,634,227
- Issue date Jan 6, 1987
- Canon Kabushiki Kaisha
- Norihisa Nishimura
- G02 - OPTICS
Information Patent Grant
Liquid-jet recording head
- Patent number 4,450,457
- Issue date May 22, 1984
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
EVALUATION METHOD AND FABRICATION METHOD OF OPTICAL ELEMENT HAVING...
- Publication number 20090218505
- Publication date Sep 3, 2009
- Canon Kabushiki Kaisha
- Takeshi MIYACHI
- G02 - OPTICS
Information Patent Application
METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE AND METHOD OF DIVIDING...
- Publication number 20070275493
- Publication date Nov 29, 2007
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G02 - OPTICS
Information Patent Application
Evaluation method and fabrication method of optical element having...
- Publication number 20050271957
- Publication date Dec 8, 2005
- Takeshi Miyachi
- G02 - OPTICS
Information Patent Application
Light source unit, exposure apparatus, and device manufacturing method
- Publication number 20050157279
- Publication date Jul 21, 2005
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- B82 - NANO-TECHNOLOGY
Information Patent Application
Apparatus and method for retaining mirror, and mirror exchange method
- Publication number 20050057827
- Publication date Mar 17, 2005
- Takeshi Miyachi
- G02 - OPTICS
Information Patent Application
Mask pattern magnification correction method, magnification correct...
- Publication number 20030023339
- Publication date Jan 30, 2003
- Canon Kabushiki Kaisha
- Akira Moriya
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Takeshi MIYACHI

Person

Patents Grantslast 30 patents

Evaluation method and fabrication method of optical element having...

Evaluation method and fabrication method of optical element having...

Method of manufacturing image display device and method of dividing...

Light source unit, exposure apparatus, and device manufacturing method

Apparatus and method for retaining mirror, and mirror exchange method

Mask pattern magnification correction method, magnification correct...

Exposure method, exposure apparatus and semiconductor manufacturing...

Mask holding device, exposure apparatus and device manufacturing me...

X-ray mask structure and method of making the same

X-ray mask and X-ray exposure method using the same

X-ray exposure apparatus

Mask structure and mask holding mechanism for exposure apparatus

Scanning exposure method and mask therefor

Mask structure and method of making the same

Mask supporting device and correction method therefor, and exposure...

Method of making X-ray mask structure

X-ray exposure apparatus

Photomask comprising a holding frame and reinforcing member with a...

Method and apparatus for measuring positional deviation while corre...

X-ray mask, and exposure apparatus and device production using the...

X-ray mask structure

Optical modulating device having projection on substrate for regist...

Liquid-jet recording head

Patents Applicationslast 30 patents

EVALUATION METHOD AND FABRICATION METHOD OF OPTICAL ELEMENT HAVING...

METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE AND METHOD OF DIVIDING...

Evaluation method and fabrication method of optical element having...

Light source unit, exposure apparatus, and device manufacturing method

Apparatus and method for retaining mirror, and mirror exchange method

Mask pattern magnification correction method, magnification correct...