Takeshi Nagata

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and patterning process
- Patent number 12,204,245
- Issue date Jan 21, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 11,846,884
- Issue date Dec 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,835,859
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of cleaning and drying semiconductor substrate
- Patent number 10,811,247
- Issue date Oct 20, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Process for forming multi-layer film and patterning process
- Patent number 9,658,530
- Issue date May 23, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method for cleaning and drying semiconductor substrate
- Patent number 9,524,863
- Issue date Dec 20, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Acetal compound, polymer, resist composition, and patterning process
- Patent number 8,791,290
- Issue date Jul 29, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,778,592
- Issue date Jul 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,691,494
- Issue date Apr 8, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified resist composition and patterning process
- Patent number 8,628,908
- Issue date Jan 14, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,492,078
- Issue date Jul 23, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process, resist composition, and acetal compound
- Patent number 8,440,386
- Issue date May 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist compositions and patterning process
- Patent number 7,449,277
- Issue date Nov 11, 2008
- Shin-Etsu Chemical C., Ltd
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Amine compounds, resist compositions and patterning process
- Patent number 6,749,988
- Issue date Jun 15, 2004
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salts, photoacid generators, resist compositions, and pattern...
- Patent number 6,692,893
- Issue date Feb 17, 2004
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Onium salts, photoacid generators for resist compositions, resist c...
- Patent number 6,440,634
- Issue date Aug 27, 2002
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist compositions and patterning process
- Patent number 6,338,931
- Issue date Jan 15, 2002
- Shin-Etsu Chemical Co., Ltd.
- Kazunori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compositions
- Patent number 6,274,286
- Issue date Aug 14, 2001
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution...
- Patent number 6,030,746
- Issue date Feb 29, 2000
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Nagata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,849,461
- Issue date Dec 15, 1998
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 5,750,309
- Issue date May 12, 1998
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220107559
- Publication date Apr 7, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
- Publication number 20220066319
- Publication date Mar 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220004101
- Publication date Jan 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220004100
- Publication date Jan 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20200090935
- Publication date Mar 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE
- Publication number 20180315594
- Publication date Nov 1, 2018
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- B08 - CLEANING
Information Patent Application
PROCESS FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS
- Publication number 20160008844
- Publication date Jan 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE
- Publication number 20150221500
- Publication date Aug 6, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- B08 - CLEANING
Information Patent Application
PATTERNING PROCESS
- Publication number 20120276485
- Publication date Nov 1, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120225386
- Publication date Sep 6, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120220112
- Publication date Aug 30, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND
- Publication number 20110236826
- Publication date Sep 29, 2011
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110236831
- Publication date Sep 29, 2011
- Shin-Etsu Chemical Co., Ltd.
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS
- Publication number 20110177462
- Publication date Jul 21, 2011
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist compositions and patterning process
- Publication number 20070072115
- Publication date Mar 29, 2007
- SHIN-ETSU CHEMICAL CO., LTD.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Amine compounds, resist compositions and patterning process
- Publication number 20020098443
- Publication date Jul 25, 2002
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel onium salts, photoacid generators, resist compositions, and p...
- Publication number 20020076643
- Publication date Jun 20, 2002
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Takeshi Nagata

Person

Patents Grantslast 30 patents

Positive resist composition and patterning process

Chemically amplified resist composition and patterning process

Resist composition and patterning process

Method of cleaning and drying semiconductor substrate

Process for forming multi-layer film and patterning process

Method for cleaning and drying semiconductor substrate

Acetal compound, polymer, resist composition, and patterning process

Positive resist composition and patterning process

Patterning process

Chemically amplified resist composition and patterning process

Patterning process

Patterning process, resist composition, and acetal compound

Positive resist compositions and patterning process

Amine compounds, resist compositions and patterning process

Onium salts, photoacid generators, resist compositions, and pattern...

Onium salts, photoacid generators for resist compositions, resist c...

Resist compositions and patterning process

Resist compositions

Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution...

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Patents Applicationslast 30 patents

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS

METHOD OF CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE

PROCESS FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS

METHOD FOR CLEANING AND DRYING SEMICONDUCTOR SUBSTRATE

PATTERNING PROCESS

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS, RESIST COMPOSITION, AND ACETAL COMPOUND

ACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

PATTERNING PROCESS

Positive resist compositions and patterning process

Amine compounds, resist compositions and patterning process

Novel onium salts, photoacid generators, resist compositions, and p...