Takeshi Ohashi

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Hitachi-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive element, method for formation of resist pattern, and...
- Patent number 8,501,392
- Issue date Aug 6, 2013
- Hitachi Chemical Company, Ltd.
- Manabu Saitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive film for circuit formation and process for producing...
- Patent number 7,067,226
- Issue date Jun 27, 2006
- Hitachi Chemical Co., Ltd.
- Masao Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING T...
- Publication number 20100041785
- Publication date Feb 18, 2010
- Hitachi Chemical Company, Ltd.
- Takeshi Ohashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND...
- Publication number 20090297982
- Publication date Dec 3, 2009
- Manabu Saitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive film for circuit formation and process for producing...
- Publication number 20040112859
- Publication date Jun 17, 2004
- Masao Kubota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY