Takeshi SASAMI

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and patterning process
- Patent number 11,609,497
- Issue date Mar 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Sasami
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning process
- Patent number 11,327,400
- Issue date May 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, patterning process, and barium salt
- Patent number 11,163,232
- Issue date Nov 2, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,156,916
- Issue date Oct 26, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,520,809
- Issue date Dec 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,474,030
- Issue date Nov 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, patterning process, and barium, cesium and ceri...
- Patent number 10,078,264
- Issue date Sep 18, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 9,261,783
- Issue date Feb 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer, polymer, resist composition, and patterning pr...
- Patent number 9,115,074
- Issue date Aug 25, 2015
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,916,331
- Issue date Dec 23, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition for ArF immersion...
- Patent number 8,815,492
- Issue date Aug 26, 2014
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 8,697,903
- Issue date Apr 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer, polymer, resist composition, and patterning pr...
- Patent number 8,647,808
- Issue date Feb 11, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi Sagehashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 8,420,292
- Issue date Apr 16, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20200218154
- Publication date Jul 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takeshi SASAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20190324368
- Publication date Oct 24, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20190163065
- Publication date May 30, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM SALT
- Publication number 20190113846
- Publication date Apr 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20180101094
- Publication date Apr 12, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20180088463
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20150268555
- Publication date Sep 24, 2015
- Shin-Etsu Chemical Co., Ltd.
- Kenji FUNATSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20140114080
- Publication date Apr 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Masayoshi SAGEHASHI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20140051024
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi KINSHO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130108964
- Publication date May 2, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...
- Publication number 20130034813
- Publication date Feb 7, 2013
- Shin-Etsu Chemical Co., Ltd.
- Youichi Ohsawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120148945
- Publication date Jun 14, 2012
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20120083580
- Publication date Apr 5, 2012
- Takeshi KINSHO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
- Publication number 20110250539
- Publication date Oct 13, 2011
- Masayoshi SAGEHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110177455
- Publication date Jul 21, 2011
- Yuji HARADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takeshi SASAMI

Person

Patents Grantslast 30 patents

Resist composition and patterning process

Patterning process

Resist composition, patterning process, and barium salt

Resist composition and patterning process

Resist composition and patterning process

Resist composition and patterning process

Resist composition, patterning process, and barium, cesium and ceri...

Fluorinated ester monomer, making method, fluorinated ester polymer...

Fluorinated monomer, polymer, resist composition, and patterning pr...

Resist composition and patterning process

Chemically amplified positive resist composition for ArF immersion...

Fluorinated ester monomer, making method, fluorinated ester polymer...

Fluorinated monomer, polymer, resist composition, and patterning pr...

Polymer, resist composition, and patterning process

Patents Applicationslast 30 patents

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS

RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM SALT

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION...

RESIST COMPOSITION AND PATTERNING PROCESS

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

FLUORINATED MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...

POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS