Takeshi SHIMOAOKI

Person

Koshi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and recording medium capable of suppres...
- Patent number 11,079,679
- Issue date Aug 3, 2021
- Tokyo Electron Limited
- Yusaku Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Development processing apparatus, development processing method, an...
- Patent number 10,359,702
- Issue date Jul 23, 2019
- Tokyo Electron Limited
- Takeshi Shimoaoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Development method, development device, and non-transitory computer...
- Patent number 10,203,605
- Issue date Feb 12, 2019
- Tokyo Electron Limited
- Yusaku Hashimoto
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing method, substrate processing apparatus, and no...
- Patent number 10,185,220
- Issue date Jan 22, 2019
- Tokyo Electron Limited
- Yusaku Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Developing method, developing apparatus, and storage medium
- Patent number 10,108,111
- Issue date Oct 23, 2018
- Tokyo Electron Limited
- Takeshi Shimoaoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing method, developing apparatus and storage medium
- Patent number 9,690,202
- Issue date Jun 27, 2017
- Tokyo Electron Limited
- Yuichi Terashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinse treatment method, developing treatment method and developing...
- Patent number 7,977,039
- Issue date Jul 12, 2011
- Tokyo Electron Limited
- Takeshi Shimoaoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing method and developing method
- Patent number 7,419,773
- Issue date Sep 2, 2008
- Tokyo Electron Limited
- Ryouichirou Naitou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20240248413
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM CAPABLE OF SUPPRES...
- Publication number 20200050111
- Publication date Feb 13, 2020
- TOKYO ELECTRON LIMITED
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT PROCESSING APPARATUS, DEVELOPMENT PROCESSING METHOD, AN...
- Publication number 20190146344
- Publication date May 16, 2019
- TOKYO ELECTRON LIMITED
- Takeshi Shimoaoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Developing Method, Developing Apparatus, and Storage Medium
- Publication number 20180284652
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Takeshi SHIMOAOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...
- Publication number 20180157178
- Publication date Jun 7, 2018
- TOKYO ELECTRON LIMITED
- Yusaku Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEVELOPMENT METHOD, DEVELOPMENT DEVICE, AND NON-TRANSITORY COMPUTER...
- Publication number 20170285481
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Yusaku HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND NO...
- Publication number 20170102616
- Publication date Apr 13, 2017
- TOKYO ELECTRON LIMITED
- Yusaku HASHIMOTO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
DEVELOPING METHOD, DEVELOPING APPARATUS AND STORAGE MEDIUM
- Publication number 20160070171
- Publication date Mar 10, 2016
- TOKYO ELECTRON LIMITED
- Yuichi TERASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing method and developing method
- Publication number 20090042149
- Publication date Feb 12, 2009
- Ryouichirou Naitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate Processing Method
- Publication number 20090004607
- Publication date Jan 1, 2009
- Takeshi Shimoaoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinsing method and developing method
- Publication number 20070134601
- Publication date Jun 14, 2007
- Ryouichirou Naitou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Rinse treatment method, developing treatment method and developing...
- Publication number 20070072092
- Publication date Mar 29, 2007
- TOKYO ELECTRON LIMITED
- Takeshi Shimoaoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takeshi SHIMOAOKI

Person

Patents Grantslast 30 patents

Substrate processing method and recording medium capable of suppres...

Development processing apparatus, development processing method, an...

Development method, development device, and non-transitory computer...

Substrate processing method, substrate processing apparatus, and no...

Developing method, developing apparatus, and storage medium

Developing method, developing apparatus and storage medium

Rinse treatment method, developing treatment method and developing...

Rinsing method and developing method

Patents Applicationslast 30 patents

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM CAPABLE OF SUPPRES...

DEVELOPMENT PROCESSING APPARATUS, DEVELOPMENT PROCESSING METHOD, AN...

Developing Method, Developing Apparatus, and Storage Medium

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND REC...

DEVELOPMENT METHOD, DEVELOPMENT DEVICE, AND NON-TRANSITORY COMPUTER...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND NO...

DEVELOPING METHOD, DEVELOPING APPARATUS AND STORAGE MEDIUM

Rinsing method and developing method

Substrate Processing Method

Rinsing method and developing method

Rinse treatment method, developing treatment method and developing...