Takeyoshi Ohashi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam system
- Patent number 12,068,128
- Issue date Aug 20, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope and method of adjusting focus of electron micro...
- Patent number 11,670,479
- Issue date Jun 6, 2023
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning electron microscope and method for measuring pattern
- Patent number 11,276,554
- Issue date Mar 15, 2022
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system, image processing device and inspection method
- Patent number 10,943,762
- Issue date Mar 9, 2021
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam device and aberration correction method for c...
- Patent number 10,727,024
- Issue date Jul 28, 2020
- Hitachi High-Technologies Corporation
- Kotoko Urano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration correction method, aberration correction system, and cha...
- Patent number 10,446,361
- Issue date Oct 15, 2019
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 10,134,558
- Issue date Nov 20, 2018
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating shape before shrink and CD-SEM apparatus
- Patent number 9,830,524
- Issue date Nov 28, 2017
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam equipment
- Patent number 9,543,053
- Issue date Jan 10, 2017
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Measurement method, image processing device, and charged particle b...
- Patent number 9,536,170
- Issue date Jan 3, 2017
- Hitachi High-Technologies Corporation
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged-particle beam device
- Patent number 9,443,695
- Issue date Sep 13, 2016
- Hitachi High-Technologies Corporation
- Takeyoshi Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring method, data processing apparatus and electron microscope...
- Patent number 9,305,744
- Issue date Apr 5, 2016
- Hitachi High-Technologies Corporation
- Takeyoshi Ohashi
- G01 - MEASURING TESTING
Information Patent Grant
Aberration corrector and charged particle beam apparatus using the...
- Patent number 9,287,084
- Issue date Mar 15, 2016
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle instrument
- Patent number 9,230,775
- Issue date Jan 5, 2016
- Hitachi High-Technologies Corporation
- Takeyoshi Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen potential measuring method, and charged particle beam device
- Patent number 9,129,775
- Issue date Sep 8, 2015
- Hitachi High-Technologies Corporation
- Tatsuaki Ishijima
- G01 - MEASURING TESTING
Information Patent Grant
Pattern evaluation method, device therefor, and electron beam device
- Patent number 8,816,277
- Issue date Aug 26, 2014
- Hitachi High-Technologies Corporation
- Hiromasa Yamanashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Electron beam device
- Patent number 8,735,814
- Issue date May 27, 2014
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 8,704,175
- Issue date Apr 22, 2014
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and inspection method using same
- Patent number 8,637,820
- Issue date Jan 28, 2014
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged Particle Beam System
- Publication number 20240371601
- Publication date Nov 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230411111
- Publication date Dec 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Tetsuro KADOWAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20220351938
- Publication date Nov 3, 2022
- HITACHI HIGH-TECH CORPORATION
- Yusuke NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON MICROSCOPE AND METHOD OF ADJUSTING FOCUS OF ELECTRON MICRO...
- Publication number 20210384006
- Publication date Dec 9, 2021
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND METHOD FOR MEASURING PATTERN
- Publication number 20210043420
- Publication date Feb 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Takeyoshi Ohashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD AND CHARGED PARTIC...
- Publication number 20200219243
- Publication date Jul 9, 2020
- Hitachi High-Technologies Corporation
- Takeyoshi OHASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION SYSTEM, IMAGE PROCESSING DEVICE AND INSPECTION METHOD
- Publication number 20190244783
- Publication date Aug 8, 2019
- Hitachi High-Technologies Corporation
- Takeyoshi OHASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND ABERRATION CORRECTION METHOD FOR C...
- Publication number 20190214222
- Publication date Jul 11, 2019
- Hitachi High-Technologies Corporation
- Kotoko URANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHA...
- Publication number 20180190469
- Publication date Jul 5, 2018
- Hitachi High-Technologies Corporation
- Zhaohui CHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20170018394
- Publication date Jan 19, 2017
- Hitachi High-Technologies Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM DEVICE
- Publication number 20150348747
- Publication date Dec 3, 2015
- Hitachi High-Technologies Corporation
- Takeyoshi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE...
- Publication number 20150248944
- Publication date Sep 3, 2015
- Hitachi High-Technologies Corporation
- Zhaohui Cheng
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE B...
- Publication number 20150110406
- Publication date Apr 23, 2015
- Takeyoshi Ohashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRON BEAM EQUIPMENT
- Publication number 20150034836
- Publication date Feb 5, 2015
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD FOR ESTIMATING SHAPE BEFORE SHRINK AND CD-SEM APPARATUS
- Publication number 20150036914
- Publication date Feb 5, 2015
- Hitachi High-Technologies Corporation
- Tomoko Sekiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MEASURING METHOD, DATA PROCESSING APPARATUS AND ELECTRON MICROSCOPE...
- Publication number 20140246585
- Publication date Sep 4, 2014
- Hitachi High-Technologies Corporation
- Takeyoshi Ohashi
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON BEAM DEVICE
- Publication number 20130270435
- Publication date Oct 17, 2013
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20130175447
- Publication date Jul 11, 2013
- Hitachi High-Technologies Corporation
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN EVALUATION METHOD, DEVICE THEREFOR, AND ELECTRON BEAM DEVICE
- Publication number 20130026361
- Publication date Jan 31, 2013
- Hitachi High-Technologies Corporation
- Hiromasa Yamanashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND INSPECTION METHOD USING SAME
- Publication number 20120286158
- Publication date Nov 15, 2012
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE INSTRUMENT
- Publication number 20120286160
- Publication date Nov 15, 2012
- Hitachi High-Technologies Corporation
- Takeyoshi OHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPECIMEN POTENTIAL MEASURING METHOD, AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20120119085
- Publication date May 17, 2012
- Hitachi High-Technologies Corporation
- Tatsuaki Ishijima
- G01 - MEASURING TESTING

Takeyoshi Ohashi

Person

Patents Grantslast 30 patents

Charged particle beam system

Electron microscope and method of adjusting focus of electron micro...

Scanning electron microscope and method for measuring pattern

Inspection system, image processing device and inspection method

Charged particle beam device and aberration correction method for c...

Aberration correction method, aberration correction system, and cha...

Scanning electron microscope

Method for estimating shape before shrink and CD-SEM apparatus

Electron beam equipment

Measurement method, image processing device, and charged particle b...

Charged-particle beam device

Measuring method, data processing apparatus and electron microscope...

Aberration corrector and charged particle beam apparatus using the...

Charged particle instrument

Specimen potential measuring method, and charged particle beam device

Pattern evaluation method, device therefor, and electron beam device

Electron beam device

Scanning electron microscope

Scanning electron microscope and inspection method using same

Patents Applicationslast 30 patents

Charged Particle Beam System

Charged Particle Beam Apparatus

Charged Particle Beam System

ELECTRON MICROSCOPE AND METHOD OF ADJUSTING FOCUS OF ELECTRON MICRO...

SCANNING ELECTRON MICROSCOPE AND METHOD FOR MEASURING PATTERN

IMAGE PROCESSING DEVICE, IMAGE PROCESSING METHOD AND CHARGED PARTIC...

INSPECTION SYSTEM, IMAGE PROCESSING DEVICE AND INSPECTION METHOD

CHARGED PARTICLE BEAM DEVICE AND ABERRATION CORRECTION METHOD FOR C...

ABERRATION CORRECTION METHOD, ABERRATION CORRECTION SYSTEM, AND CHA...

Scanning Electron Microscope

CHARGED-PARTICLE BEAM DEVICE

ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE...

MEASUREMENT METHOD, IMAGE PROCESSING DEVICE, AND CHARGED PARTICLE B...

ELECTRON BEAM EQUIPMENT

METHOD FOR ESTIMATING SHAPE BEFORE SHRINK AND CD-SEM APPARATUS

MEASURING METHOD, DATA PROCESSING APPARATUS AND ELECTRON MICROSCOPE...

ELECTRON BEAM DEVICE

Scanning Electron Microscope

PATTERN EVALUATION METHOD, DEVICE THEREFOR, AND ELECTRON BEAM DEVICE

SCANNING ELECTRON MICROSCOPE AND INSPECTION METHOD USING SAME

CHARGED PARTICLE INSTRUMENT

SPECIMEN POTENTIAL MEASURING METHOD, AND CHARGED PARTICLE BEAM DEVICE