Takeyuki Yamada

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank substrate processing device, mask blank substrate proces...
- Patent number 10,481,488
- Issue date Nov 19, 2019
- Hoya Corporation
- Takeyuki Yamada
- B24 - GRINDING POLISHING
Information Patent Grant
Method for manufacturing mask blank substrate, method for manufactu...
- Patent number 10,310,373
- Issue date Jun 4, 2019
- Hoya Corporation
- Takeyuki Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask blank, method of manufacturing the same, and transfer mask
- Patent number 9,104,112
- Issue date Aug 11, 2015
- Hoya Corporation
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface treatment method for a mask blank, method of manufacturing...
- Patent number 8,802,334
- Issue date Aug 12, 2014
- Hoya Corporation
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of cleaning substrate
- Patent number 8,748,062
- Issue date Jun 10, 2014
- Osaka University
- Kazuto Yamauchi
- B24 - GRINDING POLISHING
Information Patent Grant
Photomask blank and production method thereof, and photomask produc...
- Patent number 8,697,315
- Issue date Apr 15, 2014
- Hoya Corporation
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and production method thereof, and photomask produc...
- Patent number 8,114,556
- Issue date Feb 14, 2012
- Hoya Corporation
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer reflective film coated substrate, manufacturing method t...
- Patent number 8,081,384
- Issue date Dec 20, 2011
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photomask blank and method of producing the same, method of produci...
- Patent number 7,901,842
- Issue date Mar 8, 2011
- Hoya Corporation
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer reflective film coated substrate, manufacturing method t...
- Patent number 7,804,648
- Issue date Sep 28, 2010
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK SUBSTRATE PROCESSING DEVICE, MASK BLANK SUBSTRATE PROCES...
- Publication number 20150370160
- Publication date Dec 24, 2015
- Hoya Corporation
- Takeyuki YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING MASK BLANK SUBSTRATE, METHOD FOR MANUFACTU...
- Publication number 20150355537
- Publication date Dec 10, 2015
- HOYA CORPORATION
- Takeyuki YAMADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK
- Publication number 20150111134
- Publication date Apr 23, 2015
- HOYA CORPORATION
- Toshiyuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK
- Publication number 20150079502
- Publication date Mar 19, 2015
- HOYA CORPORATION
- Toshiyuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CLEANING SUBSTRATE
- Publication number 20140230848
- Publication date Aug 21, 2014
- HOYA CORPORATION
- Kazuto YAMAUCHI
- B08 - CLEANING
Information Patent Application
MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND TRANSFER MASK
- Publication number 20130177841
- Publication date Jul 11, 2013
- HOYA CORPORATION
- Kazuya Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CLEANING SUBSTRATE
- Publication number 20120276474
- Publication date Nov 1, 2012
- HOYA CORPORATION
- Kazuto YAMAUCHI
- B08 - CLEANING
Information Patent Application
SURFACE TREATMENT METHOD FOR A MASK BLANK, METHOD OF MANUFACTURING...
- Publication number 20120258388
- Publication date Oct 11, 2012
- HOYA CORPORATION
- Takeyuki YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...
- Publication number 20120129084
- Publication date May 24, 2012
- HOYA CORPORATION
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD OF PRODUCING THE SAME, METHOD OF PRODUCI...
- Publication number 20090233182
- Publication date Sep 17, 2009
- HOYA CORPORATION
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...
- Publication number 20090155698
- Publication date Jun 18, 2009
- HOYA CORPORATION
- Takeyuki Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask Blank, Photomask Manufacturing Method and Semiconductor D...
- Publication number 20080305406
- Publication date Dec 11, 2008
- HOYA CORPORATION
- Atsushi Kominato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayer reflective film coated substrate, manufacturing method t...
- Publication number 20070091420
- Publication date Apr 26, 2007
- Hoya Corporation
- Morio Hosoya
- G02 - OPTICS
Information Patent Application
Multilayer reflective film coated substrate, manufacturing method t...
- Publication number 20070091421
- Publication date Apr 26, 2007
- Hoya Corporation
- Mario Hosoya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takeyuki Yamada

Person

Patents Grantslast 30 patents

Mask blank substrate processing device, mask blank substrate proces...

Method for manufacturing mask blank substrate, method for manufactu...

Mask blank, method of manufacturing the same, and transfer mask

Surface treatment method for a mask blank, method of manufacturing...

Method of cleaning substrate

Photomask blank and production method thereof, and photomask produc...

Photomask blank and production method thereof, and photomask produc...

Multilayer reflective film coated substrate, manufacturing method t...

Photomask blank and method of producing the same, method of produci...

Multilayer reflective film coated substrate, manufacturing method t...

Patents Applicationslast 30 patents

MASK BLANK SUBSTRATE PROCESSING DEVICE, MASK BLANK SUBSTRATE PROCES...

METHOD FOR MANUFACTURING MASK BLANK SUBSTRATE, METHOD FOR MANUFACTU...

MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK

MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK

METHOD OF CLEANING SUBSTRATE

MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND TRANSFER MASK

METHOD OF CLEANING SUBSTRATE

SURFACE TREATMENT METHOD FOR A MASK BLANK, METHOD OF MANUFACTURING...

PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...

PHOTOMASK BLANK AND METHOD OF PRODUCING THE SAME, METHOD OF PRODUCI...

PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUC...

Photomask Blank, Photomask Manufacturing Method and Semiconductor D...

Multilayer reflective film coated substrate, manufacturing method t...

Multilayer reflective film coated substrate, manufacturing method t...