Taku GOHIRA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 12,080,521
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,804,379
- Issue date Oct 31, 2023
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,749,508
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, substrate processing apparatus and cle...
- Patent number 11,631,590
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Muneyuki Omi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon containing films selectively against each...
- Patent number 11,404,281
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method including cleaning of inside of chamber ma...
- Patent number 11,342,167
- Issue date May 24, 2022
- Tokyo Electron Limited
- Jin Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 11,251,049
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon containing films selectively against each...
- Patent number 10,903,084
- Issue date Jan 26, 2021
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 10,811,275
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method including cleaning of inside of chamber ma...
- Patent number 10,714,320
- Issue date Jul 14, 2020
- Tokyo Electron Limited
- Jin Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mounting table and plasma processing apparatus
- Patent number 10,714,370
- Issue date Jul 14, 2020
- Tokyo Electron Limited
- Taketoshi Tomioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 10,410,877
- Issue date Sep 10, 2019
- Tokyo Electron Limited
- Ryuichi Takashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing target object
- Patent number 10,361,070
- Issue date Jul 23, 2019
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon oxide and silicon nitride selectively aga...
- Patent number 10,304,691
- Issue date May 28, 2019
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20230360891
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220310361
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Tsukasa HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220059361
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220059360
- Publication date Feb 24, 2022
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20210265135
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Michiko NAKAYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON CONTAINING FILMS SELECTIVELY AGAINST EACH...
- Publication number 20210104413
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND CLE...
- Publication number 20210035814
- Publication date Feb 4, 2021
- TOKYO ELECTRON LIMITED
- Muneyuki Omi
- B08 - CLEANING
Information Patent Application
PLASMA PROCESSING METHOD INCLUDING CLEANING OF INSIDE OF CHAMBER MA...
- Publication number 20200321200
- Publication date Oct 8, 2020
- TOKYO ELECTRON LIMITED
- Jin Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200321219
- Publication date Oct 8, 2020
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20190252203
- Publication date Aug 15, 2019
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON CONTAINING FILMS SELECTIVELY AGAINST EACH...
- Publication number 20190244829
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING MULTILAYERED FILM
- Publication number 20190043721
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING TARGET OBJECT
- Publication number 20180211822
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD INCLUDING CLEANING OF INSIDE OF CHAMBER MA...
- Publication number 20180211824
- Publication date Jul 26, 2018
- TOKYO ELECTRON LIMITED
- Jin Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING SILICON OXIDE AND SILICON NITRIDE SELECTIVELY AGA...
- Publication number 20180076048
- Publication date Mar 15, 2018
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20170330759
- Publication date Nov 16, 2017
- TOKYO ELECTRON LIMITED
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20170178922
- Publication date Jun 22, 2017
- TOKYO ELECTRON LIMITED
- Ryuichi TAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOUNTING TABLE AND PLASMA PROCESSING APPARATUS
- Publication number 20140238609
- Publication date Aug 28, 2014
- TOKYO ELECTRON LIMITED
- Taketoshi TOMIOKA
- H01 - BASIC ELECTRIC ELEMENTS

Taku GOHIRA

Person

Patents Grantslast 30 patents

Plasma processing method

Etching method and plasma processing apparatus

Plasma processing method

Substrate processing method, substrate processing apparatus and cle...

Method of etching silicon containing films selectively against each...

Plasma processing method including cleaning of inside of chamber ma...

Etching method and plasma processing apparatus

Method of etching silicon containing films selectively against each...

Plasma etching method and plasma etching apparatus

Plasma processing method including cleaning of inside of chamber ma...

Mounting table and plasma processing apparatus

Etching method

Method of processing target object

Method of etching silicon oxide and silicon nitride selectively aga...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD

METHOD OF ETCHING SILICON CONTAINING FILMS SELECTIVELY AGAINST EACH...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND CLE...

PLASMA PROCESSING METHOD INCLUDING CLEANING OF INSIDE OF CHAMBER MA...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

METHOD OF ETCHING SILICON CONTAINING FILMS SELECTIVELY AGAINST EACH...

METHOD OF ETCHING MULTILAYERED FILM

METHOD OF PROCESSING TARGET OBJECT

PLASMA PROCESSING METHOD INCLUDING CLEANING OF INSIDE OF CHAMBER MA...

METHOD OF ETCHING SILICON OXIDE AND SILICON NITRIDE SELECTIVELY AGA...

ETCHING METHOD

ETCHING METHOD

MOUNTING TABLE AND PLASMA PROCESSING APPARATUS