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Kanagawa, JP
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last 30 patents
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,324,377
Issue date
Jun 18, 2019
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
10,101,658
Issue date
Oct 16, 2018
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method of producing structure containing phase-separated structure,...
Patent number
10,100,221
Issue date
Oct 16, 2018
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi Yamano
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of producing structure containing phase-separated structure...
Patent number
10,066,096
Issue date
Sep 4, 2018
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Kurosawa
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Method of producing structure containing phase-separated structure
Patent number
9,816,003
Issue date
Nov 14, 2017
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Kurosawa
B82 - NANO-TECHNOLOGY
Information
Patent Grant
Compound, positive resist composition and resist pattern forming me...
Patent number
8,389,197
Issue date
Mar 5, 2013
Tokyo Ohka Kogyo Co., Ltd.
Takako Hirosaki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
Patent number
8,304,163
Issue date
Nov 6, 2012
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Positive resist composition and resist pattern forming method
Patent number
8,206,887
Issue date
Jun 26, 2012
Tokyo Ohka Kogyo Co., Ltd.
Takako Hirosaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition
Patent number
8,198,004
Issue date
Jun 12, 2012
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Compound, positive resist composition and method for forming resist...
Patent number
8,017,300
Issue date
Sep 13, 2011
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Negative resist composition and method of forming resist pattern
Patent number
7,981,588
Issue date
Jul 19, 2011
Tokyo Ohka Kogyo Co., Ltd.
Takako Hirosaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Compound, method for producing same, positive resist composition an...
Patent number
7,960,089
Issue date
Jun 14, 2011
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Compound, dissolution inhibitor, positive type resist composition,...
Patent number
7,943,284
Issue date
May 17, 2011
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Base material for pattern-forming material, positive resist composi...
Patent number
7,923,192
Issue date
Apr 12, 2011
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and process for formation of resist patterns
Patent number
7,901,865
Issue date
Mar 8, 2011
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition and method of forming resist pattern
Patent number
7,897,319
Issue date
Mar 1, 2011
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Compound, positive resist composition and method of forming resist...
Patent number
7,862,981
Issue date
Jan 4, 2011
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, resist pattern forming method and compound
Patent number
7,851,129
Issue date
Dec 14, 2010
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist composition and method for forming resist pattern
Patent number
7,682,770
Issue date
Mar 23, 2010
Tokyo Ohka Kogyo Co., Ltd.
Hideo Hada
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition, method for forming resist pattern and...
Patent number
7,648,816
Issue date
Jan 19, 2010
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition
Patent number
7,541,138
Issue date
Jun 2, 2009
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist composition
Patent number
7,527,909
Issue date
May 5, 2009
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition, method for resist pattern formation an...
Patent number
7,504,196
Issue date
Mar 17, 2009
Tokyo Ohka Kogyo Co., Ltd.
Daju Shiono
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Resist composition
Patent number
7,501,220
Issue date
Mar 10, 2009
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Material for forming resist protecting film for use in liquid immer...
Patent number
7,371,510
Issue date
May 13, 2008
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition for liquid immersion exposure process and method...
Patent number
7,264,918
Issue date
Sep 4, 2007
Tokyo Ohka Kogyo Co., Ltd.
Kotaro Endo
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive photoresist composition
Patent number
5,738,968
Issue date
Apr 14, 1998
Tokyo Ohka Kogyo Co., Ltd.
Hiroshi Hosoda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20160363860
Publication date
Dec 15, 2016
Tokyo Ohka Kogyo Co., Ltd.
Taku HIRAYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE,...
Publication number
20160333217
Publication date
Nov 17, 2016
Tokyo Ohka Kogyo Co., Ltd.
Hitoshi YAMANO
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE...
Publication number
20160280906
Publication date
Sep 29, 2016
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi KUROSAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20160209745
Publication date
Jul 21, 2016
Tokyo Ohka Kogyo Co., Ltd.
Taku HIRAYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE
Publication number
20150118397
Publication date
Apr 30, 2015
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Kurosawa
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
Publication number
20110091810
Publication date
Apr 21, 2011
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Application
COMPOUND, METHOD FOR PRODUCING SAME, POSITIVE RESIST COMPOSITION AN...
Publication number
20100183974
Publication date
Jul 22, 2010
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST...
Publication number
20100009284
Publication date
Jan 14, 2010
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20090269693
Publication date
Oct 29, 2009
Tokyo Ohka Kogyo Co., Ltd.
Takako Hirosaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20090202939
Publication date
Aug 13, 2009
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD AND COMPOUND
Publication number
20090162781
Publication date
Jun 25, 2009
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION
Publication number
20090130605
Publication date
May 21, 2009
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOUND, POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING ME...
Publication number
20090117488
Publication date
May 7, 2009
TOKYO CHKA KOGYO CO., LTD
Takako Hirosaki
C07 - ORGANIC CHEMISTRY
Information
Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
Publication number
20090092921
Publication date
Apr 9, 2009
TOKYO KOGYO CO., LTD.
Takako Hirosaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
COMPOUND, DISSOLUTION INHIBITOR, POSITIVE TYPE RESIST COMPOSITION,...
Publication number
20090081580
Publication date
Mar 26, 2009
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Application
SILSESQUIOXANE RESIN, POSITIVE RESIST COMPOSITION, RESIST LAMINATE,...
Publication number
20090068586
Publication date
Mar 12, 2009
Tokyo Ohka Kogyo Co., Ltd.
Tsuyoshi Nakamura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POSITIVE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND...
Publication number
20090035691
Publication date
Feb 5, 2009
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
C07 - ORGANIC CHEMISTRY
Information
Patent Application
IMMERSION LIQUID FOR LIQUID IMMERSION LITHOGRAPHY PROCESS AND METHO...
Publication number
20090011375
Publication date
Jan 8, 2009
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive Resist Composition, Method For Resist Pattern Formation an...
Publication number
20080145784
Publication date
Jun 19, 2008
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist Composition and Process for Formation of Resist Patterns
Publication number
20080020288
Publication date
Jan 24, 2008
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Composition for forming antireflection coating
Publication number
20070281098
Publication date
Dec 6, 2007
Taku Hirayama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Base Material for Pattern Forming Material, Positive Resist Composi...
Publication number
20070281243
Publication date
Dec 6, 2007
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Resist Composition and Method for Forming Resist Pattern
Publication number
20070275307
Publication date
Nov 29, 2007
Hideo Hada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive Resist Composition and Method of Forming Resist Pattern
Publication number
20070259273
Publication date
Nov 8, 2007
Tokyo Ohka Kogyo Co., Ltd.
Daiju Shiono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION
Publication number
20070190436
Publication date
Aug 16, 2007
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION
Publication number
20070178394
Publication date
Aug 2, 2007
Tokyo Ohka Kogyo Co., Ltd.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Material for forming resist protecting film for use in liquid immer...
Publication number
20070134593
Publication date
Jun 14, 2007
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Material for forming resist-protecting film for immersion exposure...
Publication number
20070031755
Publication date
Feb 8, 2007
TOKO OHKA KOGYO CO., LTD.
Taku Hirayama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition, resist laminates and process for formi...
Publication number
20070009828
Publication date
Jan 11, 2007
Tokyo Ohka Kogyo, Co., LTD.
Koki Tamura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Silsesquioxane resin, positive resist composition,layered product i...
Publication number
20060222866
Publication date
Oct 5, 2006
Tsuyoshi Nakamura
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...