Taku Morisawa

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming coating film for lithography
- Patent number 9,502,247
- Issue date Nov 22, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing resist composition
- Patent number 9,201,301
- Issue date Dec 1, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Fluorinated monomer, fluorinated polymer, resist composition, and p...
- Patent number 8,945,809
- Issue date Feb 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,916,331
- Issue date Dec 23, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and patterning process
- Patent number 8,778,592
- Issue date Jul 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING COATING FILM FOR LITHOGRAPHY
- Publication number 20160300706
- Publication date Oct 13, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION
- Publication number 20140335453
- Publication date Nov 13, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120220112
- Publication date Aug 30, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120148945
- Publication date Jun 14, 2012
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS
- Publication number 20110305979
- Publication date Dec 15, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yuji HARADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...
- Publication number 20110151381
- Publication date Jun 23, 2011
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Taku Morisawa

Person

Patents Grantslast 30 patents

Method for forming coating film for lithography

Method for producing resist composition

Fluorinated monomer, fluorinated polymer, resist composition, and p...

Resist composition and patterning process

Positive resist composition and patterning process

Patents Applicationslast 30 patents

METHOD FOR FORMING COATING FILM FOR LITHOGRAPHY

METHOD FOR PRODUCING RESIST COMPOSITION

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS

FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...