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Kawasaki-shi, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Positive resist composition and method of forming resist pattern
Patent number
7,402,372
Issue date
Jul 22, 2008
Tokyo Ohka Kogyo Co., Ltd.
Mitsuo Hagihara
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Positive resist composition and resist pattern formation method
Patent number
7,364,831
Issue date
Apr 29, 2008
Tokyo Ohka Kogyo Co., Ltd.
Kouji Yonemura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Method for decreasing surface defects of patterned resist layer
Patent number
7,094,924
Issue date
Aug 22, 2006
Tokyo Ohka Kogyo Co., Ltd.
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working photoresist composition
Patent number
6,677,103
Issue date
Jan 13, 2004
Tokyo Ohka Kogyo Co., Ltd.
Kazufumi Sato
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Method for decreasing surface defects of patterned resist layer
Patent number
6,605,417
Issue date
Aug 12, 2003
Tokyo Ohka Kogyo Co., Ltd.
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working photoresist composition
Patent number
6,444,394
Issue date
Sep 3, 2002
Tokyo Ohka Kogyo Co., Ltd.
Kazufumi Sato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive photoresist coating solution comprising a mixed solvent of...
Patent number
5,702,862
Issue date
Dec 30, 1997
Tokyo Ohka Kogyo Co., Ltd.
Hayato Ohno
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
High-sensitivity positive-working photoresist composition
Patent number
5,601,961
Issue date
Feb 11, 1997
Tokyo Ohka Kogyo Co., Ltd.
Kazuhiko Nakayama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Pattern forming method with selective silylation utilizing lithogra...
Patent number
5,599,653
Issue date
Feb 4, 1997
Tokyo Ohka Kogyo Co., Ltd.
Taku Nakao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Lithographic double-coated patterning plate with undercoat levellin...
Patent number
5,498,514
Issue date
Mar 12, 1996
Tokyo Ohka Kogyo Co., Ltd.
Taku Nakao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working naphthoquinone diazide sulfonic acid ester photore...
Patent number
5,478,692
Issue date
Dec 26, 1995
Tokyo Ohka Kogyo Co., Ltd.
Kousuke Doi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Positive-working naphthoquinone diazide photoresist composition con...
Patent number
5,434,031
Issue date
Jul 18, 1995
Tokyo Ohka Kogyo Co., Ltd.
Taku Nakao
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
Information
Patent Application
Positive resist composition and resist pattern formation method
Publication number
20060014100
Publication date
Jan 19, 2006
Kouji Yonemura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive resist composition and method of forming resist pattern
Publication number
20050042541
Publication date
Feb 24, 2005
Tokyo Ohka Kogyo Co., Ltd.
Mitsuo Hagihara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive-working photoresist composition
Publication number
20040072103
Publication date
Apr 15, 2004
Kazufumi Sato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Method for decreasing surface defects of patterned resist layer
Publication number
20030138736
Publication date
Jul 24, 2003
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Positive-working photoresist composition
Publication number
20020110750
Publication date
Aug 15, 2002
Kazufumi Sato
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Application
Method for decreasing surface defects of patterned resist layer
Publication number
20010014431
Publication date
Aug 16, 2001
Kazuyuki Nitta
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY