Takuhiro Taniguchi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 11,966,161
- Issue date Apr 23, 2024
- JSR Corporation
- Takuhiro Taniguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition and resist pattern-forming me...
- Patent number 11,609,495
- Issue date Mar 21, 2023
- JSR Corporation
- Katsuaki Nishikori
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
- Patent number 11,592,746
- Issue date Feb 28, 2023
- JSR Corporation
- Kazuya Kiriyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, P...
- Publication number 20240319596
- Publication date Sep 26, 2024
- JSR Corporation
- Hiromu MIYATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230244143
- Publication date Aug 3, 2023
- JSR Corporation
- Takuhiro TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230236501
- Publication date Jul 27, 2023
- JSR Corporation
- Natsuko Kinoshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20230236506
- Publication date Jul 27, 2023
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20220413385
- Publication date Dec 29, 2022
- JSR Corporation
- Kazuya KIRIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...
- Publication number 20220382152
- Publication date Dec 1, 2022
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220334481
- Publication date Oct 20, 2022
- JSR Corporation
- Takuhiro TANIGUCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220283498
- Publication date Sep 8, 2022
- JSR Corporation
- Katsuaki NISHIKORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20220269172
- Publication date Aug 25, 2022
- JSR Corporation
- Katsuaki Nishikori
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220177424
- Publication date Jun 9, 2022
- JSR Corporation
- Ryuichi NEMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20220043350
- Publication date Feb 10, 2022
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210389667
- Publication date Dec 16, 2021
- JSR Corporation
- Katsuaki Nishikori
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210325783
- Publication date Oct 21, 2021
- JSR Corporation
- Hirokazu SAKAKIBARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...
- Publication number 20210311391
- Publication date Oct 7, 2021
- JSR Corporation
- Takuhiro TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20210263413
- Publication date Aug 26, 2021
- JSR Corporation
- Kazuya KIRIYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...
- Publication number 20210124263
- Publication date Apr 29, 2021
- JSR Corporation
- Katsuaki Nishikori
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
- Publication number 20200341376
- Publication date Oct 29, 2020
- JSR Corporation
- Kazuya KIRIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takuhiro Taniguchi

Person

Patents Grantslast 30 patents

Photosensitive resin composition, method for forming resist pattern...

Radiation-sensitive resin composition, method for forming resist pa...

Radiation-sensitive resin composition, method of forming resist pat...

Radiation-sensitive resin composition and resist pattern-forming me...

Radiation-sensitive resin composition, resist pattern-forming metho...

Patents Applicationslast 30 patents

RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, P...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...

RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING ME...

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...