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Takuma Ebata

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  • Tokyo, JP
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
    • Publication number 20110223537
    • Publication date Sep 15, 2011
    • JSR Corporation
    • Takuma Ebata
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    RADIATION-SENSITIVE RESIN COMPOSITION
    • Publication number 20110143279
    • Publication date Jun 16, 2011
    • JSR Corporation
    • Tsutomu SHIMOKAWA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    COMPOUND
    • Publication number 20100324329
    • Publication date Dec 23, 2010
    • JSR Corporation
    • Tomoki Nagai
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    RADIATION-SENSITIVE RESIN COMPOSITION
    • Publication number 20100285405
    • Publication date Nov 11, 2010
    • JSR Corporation
    • Tsutomu SHIMOKAWA
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER
    • Publication number 20100255420
    • Publication date Oct 7, 2010
    • JSR Corporation
    • Hirokazu Sakakibara
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
    • Publication number 20100221659
    • Publication date Sep 2, 2010
    • JSR Corporation
    • Takuma Ebata
    • C07 - ORGANIC CHEMISTRY
  • Information Patent Application

    POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN
    • Publication number 20100063232
    • Publication date Mar 11, 2010
    • JSR Corporation
    • Tomoki Nagai
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    RADIATION-SENSITIVE RESIN COMPOSITION
    • Publication number 20100040977
    • Publication date Feb 18, 2010
    • JSR Corporation
    • Tomoki Nagai
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION
    • Publication number 20090318652
    • Publication date Dec 24, 2009
    • JSR Corporation
    • Tomoki Nagai
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Novel Compound, Polymer, and Radiation-Sensitive Composition
    • Publication number 20090069521
    • Publication date Mar 12, 2009
    • JSR Corporation
    • Tomoki Nagai
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...