Takuma Hojo

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,727,701
- Issue date Jun 1, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and resist pattern forming method
- Patent number 7,687,221
- Issue date Mar 30, 2010
- Tokyo Ohka Kogyo Co., Ltd.
- Taako Hirosaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of formation of resist patterns
- Patent number 7,524,604
- Issue date Apr 28, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition and method for forming resist pattern
- Patent number 7,449,276
- Issue date Nov 11, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Takuma Hojo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-D...
- Publication number 20090155546
- Publication date Jun 18, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Naoki Yamashita
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
- Publication number 20090047600
- Publication date Feb 19, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Takako Hirosaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive Resist Composition and Method of Forming Resist Pattern
- Publication number 20080241747
- Publication date Oct 2, 2008
- TOKYO OHKA KOGYO CO., LTD.
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist composition and method of forming resist pattern
- Publication number 20070190447
- Publication date Aug 16, 2007
- Tokyo Ohkakogyo Co. LTD.
- Toshiyuki Ogata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Positive photoresist composition and method for forming resist pattern
- Publication number 20070042288
- Publication date Feb 22, 2007
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and method of formation of resist patterns
- Publication number 20060247346
- Publication date Nov 2, 2006
- Takuma Hojo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takuma Hojo

Person

Patents Grantslast 30 patents

Positive resist composition and method of forming resist pattern

Positive resist composition and resist pattern forming method

Positive resist composition and method of formation of resist patterns

Positive photoresist composition and method for forming resist pattern

Patents Applicationslast 30 patents

FILM-FORMING COMPOSITION, METHOD FOR PATTERN FORMATION, AND THREE-D...

POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

Positive Resist Composition and Method of Forming Resist Pattern

Photoresist composition and method of forming resist pattern

Positive photoresist composition and method for forming resist pattern

Positive resist composition and method of formation of resist patterns