Takumi TOIDA

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Material for lithography, production method therefor, composition f...
- Patent number 11,852,970
- Issue date Dec 26, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Hiroto Kudo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,572,430
- Issue date Feb 7, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method for forming resist pattern, and polyphen...
- Patent number 11,480,877
- Issue date Oct 25, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resist composition, and method for forming resist pattern...
- Patent number 11,256,170
- Issue date Feb 22, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 11,243,467
- Issue date Feb 8, 2022
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 11,143,962
- Issue date Oct 12, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for forming underlayer film for lithography, composition f...
- Patent number 11,137,686
- Issue date Oct 5, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, composition, resist pattern formation method, and...
- Patent number 11,130,724
- Issue date Sep 28, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, resist composition or radiation-sensitive composit...
- Patent number 10,816,898
- Issue date Oct 27, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, and purification method thereof, material for form...
- Patent number 10,747,112
- Issue date Aug 18, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,745,372
- Issue date Aug 18, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist base material, resist composition and method for forming res...
- Patent number 10,642,156
- Issue date May 5, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, material for forming underlayer film for lithograp...
- Patent number 10,494,358
- Issue date Dec 3, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist material, resist composition and method for forming resist p...
- Patent number 10,437,148
- Issue date Oct 8, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi Toida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...
- Publication number 20200409261
- Publication date Dec 31, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
- Publication number 20200262787
- Publication date Aug 20, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM F...
- Publication number 20200249573
- Publication date Aug 6, 2020
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...
- Publication number 20190056657
- Publication date Feb 21, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION F...
- Publication number 20190041750
- Publication date Feb 7, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND...
- Publication number 20190010108
- Publication date Jan 10, 2019
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20180284607
- Publication date Oct 4, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR LITHOGRAPHY, PRODUCTION METHOD THEREFOR, COMPOSITION F...
- Publication number 20180246405
- Publication date Aug 30, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Hiroto KUDO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION F...
- Publication number 20180246409
- Publication date Aug 30, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST BASE MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RES...
- Publication number 20180107113
- Publication date Apr 19, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, AND PURIFICATION METHOD THEREOF, MATERIAL FOR FORM...
- Publication number 20180095368
- Publication date Apr 5, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND METHOD FOR FOR...
- Publication number 20180081270
- Publication date Mar 22, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20180074404
- Publication date Mar 15, 2018
- Masatoshi ECHIGO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN...
- Publication number 20180074406
- Publication date Mar 15, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHEN...
- Publication number 20180074402
- Publication date Mar 15, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...
- Publication number 20180029968
- Publication date Feb 1, 2018
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...
- Publication number 20170349564
- Publication date Dec 7, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST P...
- Publication number 20170145142
- Publication date May 25, 2017
- Mitsubishi Gas Chemical Company, Inc.
- Takumi TOIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMI...
- Publication number 20170059989
- Publication date Mar 2, 2017
- A School Corporation Kansai University
- Hiroto KUDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMI...
- Publication number 20170058079
- Publication date Mar 2, 2017
- A School Corporation Kansai University
- Hiroto KUDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Takumi TOIDA

Person

Patents Grantslast 30 patents

Material for lithography, production method therefor, composition f...

Compound, resin, resist composition or radiation-sensitive composit...

Resist composition, method for forming resist pattern, and polyphen...

Compound, resist composition, and method for forming resist pattern...

Compound, resin, resist composition or radiation-sensitive composit...

Material for forming underlayer film for lithography, composition f...

Material for forming underlayer film for lithography, composition f...

Compound, resin, composition, resist pattern formation method, and...

Compound, resin, resist composition or radiation-sensitive composit...

Compound, resin, and purification method thereof, material for form...

Compound, resin, material for forming underlayer film for lithograp...

Resist base material, resist composition and method for forming res...

Compound, resin, material for forming underlayer film for lithograp...

Resist material, resist composition and method for forming resist p...

Patents Applicationslast 30 patents

COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...

OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM F...

COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSIT...

MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION F...

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND...

RADIATION-SENSITIVE COMPOSITION

MATERIAL FOR LITHOGRAPHY, PRODUCTION METHOD THEREFOR, COMPOSITION F...

MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION F...

RESIST BASE MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RES...

COMPOUND, RESIN, AND PURIFICATION METHOD THEREOF, MATERIAL FOR FORM...

RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND METHOD FOR FOR...

RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN...

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHEN...

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...

COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAP...

RESIST MATERIAL, RESIST COMPOSITION AND METHOD FOR FORMING RESIST P...

POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMI...

POLYMER COMPOUND, RADIATION SENSITIVE COMPOSITION AND PATTERN FORMI...