Takumi Ueno

Person

Hitachi-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,852,726
- Issue date Oct 7, 2014
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photosensitive resin composition, method of creating resis...
- Patent number 8,836,089
- Issue date Sep 16, 2014
- Hitachi Chemical Company, Ltd.
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photosensitive resin composition, method for producin...
- Patent number 8,461,699
- Issue date Jun 11, 2013
- Hitachi Chemical Company, Ltd.
- Hiroshi Matsutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type photosensitive resin composition, method for producin...
- Patent number 8,426,985
- Issue date Apr 23, 2013
- Hitachi Chemical Company, Ltd.
- Hiroshi Matsutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 8,304,149
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive polymer composition, method of producing pattern and...
- Patent number 8,231,959
- Issue date Jul 31, 2012
- Hitachi Chemical DuPont Microsystems Ltd.
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-type photosensitive resin composition, method for producin...
- Patent number 8,097,386
- Issue date Jan 17, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Hajime Nakano
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,851,128
- Issue date Dec 14, 2010
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive polymer composition, method of forming relief patter...
- Patent number 7,150,947
- Issue date Dec 19, 2006
- Hitachi Chemical DuPont Microsystems Ltd.
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIS...
- Publication number 20130168859
- Publication date Jul 4, 2013
- Akitoshi Tanimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20120263920
- Publication date Oct 18, 2012
- Masayuki Ooe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...
- Publication number 20110254178
- Publication date Oct 20, 2011
- Hiroshi Matsutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTI...
- Publication number 20110250396
- Publication date Oct 13, 2011
- Hiroshi Matsutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSTIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING...
- Publication number 20110204528
- Publication date Aug 25, 2011
- Hiroshi Matsutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...
- Publication number 20110076458
- Publication date Mar 31, 2011
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...
- Publication number 20100227126
- Publication date Sep 9, 2010
- Hajime Nakano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photosensitive Polymer Composition, Method of Producing Pattern and...
- Publication number 20080220222
- Publication date Sep 11, 2008
- Ooe Masayuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive polymer composition, method of forming relief patter...
- Publication number 20070072122
- Publication date Mar 29, 2007
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Photosensitive polymer composition, method of forming relief patter...
- Publication number 20040029045
- Publication date Feb 12, 2004
- Masataka Nunomura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Takumi Ueno

Person

Patents Grantslast 30 patents

Photosensitive polymer composition, method of producing pattern and...

Positive photosensitive resin composition, method of creating resis...

Positive-type photosensitive resin composition, method for producin...

Positive-type photosensitive resin composition, method for producin...

Photosensitive polymer composition, method of forming relief patter...

Photosensitive polymer composition, method of producing pattern and...

Positive-type photosensitive resin composition, method for producin...

Photosensitive polymer composition, method of forming relief patter...

Photosensitive polymer composition, method of forming relief patter...

Patents Applicationslast 30 patents

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIS...

Photosensitive Polymer Composition, Method of Producing Pattern and...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTI...

POSTIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING...

PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTER...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCIN...

Photosensitive Polymer Composition, Method of Producing Pattern and...

Photosensitive polymer composition, method of forming relief patter...

Photosensitive polymer composition, method of forming relief patter...