Takuo Ohwada

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for removing ruthenium
- Patent number 11,732,365
- Issue date Aug 22, 2023
- Kanto Kagaku Kabushiki Kaisha
- Itsuki Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etchant composition and method for etching
- Patent number 11,512,397
- Issue date Nov 29, 2022
- Kanto Kagaku Kabushiki Kaisha
- Ryou Kouno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning liquid composition
- Patent number 11,279,904
- Issue date Mar 22, 2022
- Kanto Kagaku Kabushiki Kaisha
- Kikue Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning solution composition
- Patent number 11,046,910
- Issue date Jun 29, 2021
- Kanto Kagaku Kabushiki Kaisha
- Yumiko Taniguchi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning liquid composition for electronic device
- Patent number 9,334,470
- Issue date May 10, 2016
- Kanto Kagaku Kabushiki Kaisha
- Yumiko Taniguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Post-dry etching cleaning liquid composition and process for fabric...
- Patent number 8,513,140
- Issue date Aug 20, 2013
- Sony Corporation
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid composition for removing photoresist residue and polymer res...
- Patent number 8,105,998
- Issue date Jan 31, 2012
- Kanto Kagaku Kabushiki Kaisha
- Takuo Ohwada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method for semiconductor device
- Patent number 7,943,516
- Issue date May 17, 2011
- Renesas Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Cleaning solution and manufacturing method for semiconductor device
- Patent number 7,368,064
- Issue date May 6, 2008
- NEC Electronics Corporation
- Hidemitsu Aoki
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR REMOVING RUTHENIUM
- Publication number 20220002881
- Publication date Jan 6, 2022
- Kanto Kagaku Kabushiki Kaisha
- Itsuki KASHIWAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID COMPOSITION
- Publication number 20210163856
- Publication date Jun 3, 2021
- Kanto Kagaku Kabushiki Kaisha
- Kikue Morita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT COMPOSITION AND METHOD FOR ETCHING
- Publication number 20210123142
- Publication date Apr 29, 2021
- Kanto Kagaku Kabushiki Kaisha
- Ryou Kouno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYANIDE-FREE LIQUID COMPOSITION FOR IMMERSION GOLD PLATING
- Publication number 20210095378
- Publication date Apr 1, 2021
- Kanto Kagaku Kabushiki Kaisha
- Takahiro TSUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING SOLUTION COMPOSITION
- Publication number 20200017801
- Publication date Jan 16, 2020
- Kanto Kagaku Kabushiki Kaisha
- Yumiko TANIGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING LIQUID COMPOSITION
- Publication number 20190345419
- Publication date Nov 14, 2019
- Kanto Kagaku Kabushiki Kaisha
- Kikue MORITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHANT COMPOSITIONS AND METHOD FOR ETCHING
- Publication number 20190301026
- Publication date Oct 3, 2019
- Kanto Kagaku Kabushiki Kaisha
- Ryou Kouno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLEANING LIQUID COMPOSITION
- Publication number 20160083675
- Publication date Mar 24, 2016
- Kanto Kagaku Kabushiki Kaisha
- Kikue Morita
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
METAL OXIDE ETCHING SOLUTION AND AN ETCHING METHOD
- Publication number 20150075850
- Publication date Mar 19, 2015
- Kanto Kagaku Kabushiki Kaisha
- Takuo Ohwada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST RESIDUE AND POLYMER RESIDUE REMOVING LIQUID COMPOSITION
- Publication number 20130231271
- Publication date Sep 5, 2013
- Kanto Kagaku Kabushiki Kaisha
- Takuo Ohwada
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
CLEANING LIQUID COMPOSITION FOR ELECTRONIC DEVICE
- Publication number 20130143785
- Publication date Jun 6, 2013
- Kanto Kagaku Kabushiki Kaisha
- Yumiko TANIGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20110014793
- Publication date Jan 20, 2011
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID COMPOSITION FOR REMOVING PHOTORESIST RESIDUE AND POLYMER RES...
- Publication number 20100048443
- Publication date Feb 25, 2010
- Kanto Kagaku Kabushiki Kaisha
- Takuo Ohwada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution and manufacturing method for semiconductor device
- Publication number 20080214002
- Publication date Sep 4, 2008
- NEC ELETRONICS CORPORATION
- Hidemitsu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20080188085
- Publication date Aug 7, 2008
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Post-dry etching cleaning liquid composition and process for fabric...
- Publication number 20060019201
- Publication date Jan 26, 2006
- Masafumi Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cleaning solution and manufacturing method for semiconductor device
- Publication number 20050236362
- Publication date Oct 27, 2005
- NEC ELECTRONICS CORPORATION
- Hidemitsu Aoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing laminated structure, laminated structure, d...
- Publication number 20050007015
- Publication date Jan 13, 2005
- Seiichi Yokoyama
- G02 - OPTICS

Takuo Ohwada

Person

Patents Grantslast 30 patents

Composition for removing ruthenium

Etchant composition and method for etching

Cleaning liquid composition

Cleaning solution composition

Cleaning liquid composition for electronic device

Post-dry etching cleaning liquid composition and process for fabric...

Liquid composition for removing photoresist residue and polymer res...

Manufacturing method for semiconductor device

Cleaning solution and manufacturing method for semiconductor device

Patents Applicationslast 30 patents

COMPOSITION FOR REMOVING RUTHENIUM

CLEANING LIQUID COMPOSITION

ETCHANT COMPOSITION AND METHOD FOR ETCHING

CYANIDE-FREE LIQUID COMPOSITION FOR IMMERSION GOLD PLATING

CLEANING SOLUTION COMPOSITION

CLEANING LIQUID COMPOSITION

ETCHANT COMPOSITIONS AND METHOD FOR ETCHING

CLEANING LIQUID COMPOSITION

METAL OXIDE ETCHING SOLUTION AND AN ETCHING METHOD

PHOTORESIST RESIDUE AND POLYMER RESIDUE REMOVING LIQUID COMPOSITION

CLEANING LIQUID COMPOSITION FOR ELECTRONIC DEVICE

Post-dry etching cleaning liquid composition and process for fabric...

LIQUID COMPOSITION FOR REMOVING PHOTORESIST RESIDUE AND POLYMER RES...

Cleaning solution and manufacturing method for semiconductor device

Post-dry etching cleaning liquid composition and process for fabric...

Post-dry etching cleaning liquid composition and process for fabric...

Cleaning solution and manufacturing method for semiconductor device

Method of manufacturing laminated structure, laminated structure, d...