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Takuo Oowada
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Photoresist residue remover composition and semiconductor circuit e...
Patent number
7,816,313
Issue date
Oct 19, 2010
Kanto Kagaku Kabushiki Kaisha
Hiroshi Kawamoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for photoresist stripping solution and process of photo...
Patent number
7,816,312
Issue date
Oct 19, 2010
Kanto Kagaku Kabushiki Kaisha
Takuo Oowada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Composition for removing photoresist residue and polymer residue
Patent number
7,563,754
Issue date
Jul 21, 2009
Kanto Kagaku Kabushiki Kaisha
Takuo Oowada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Post-CMP washing liquid composition
Patent number
7,087,562
Issue date
Aug 8, 2006
Kanto Kagaku Kabushiki Kaisha
Yumiko Abe
C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information
Patent Grant
Photoresist residue removing liquid composition
Patent number
6,864,044
Issue date
Mar 8, 2005
Kanto Kagaku Kabushiki Kaisha
Norio Ishikawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist residue remover composition
Patent number
6,787,293
Issue date
Sep 7, 2004
Kanto Kagaku Kabushiki Kaisha
Takuo Oowada
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Photoresist residue remover composition and semiconductor circuit e...
Publication number
20080318424
Publication date
Dec 25, 2008
Hiroshi Kawamoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Composition for photoresist stripping solution and process of photo...
Publication number
20060205623
Publication date
Sep 14, 2006
Kanto Kagaku Kabushiki Kaisha
Takuo Oowada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Composition for removing a photoresist residue and polymer residue,...
Publication number
20060046944
Publication date
Mar 2, 2006
Kanto Kagaku Kabushiki Kaisha
Kisato Hata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Composition for removing photoresist residue and polymer residue
Publication number
20050288199
Publication date
Dec 29, 2005
Kanto Kagaku Kabushiki Kaisha
Takuo Oowada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist residue remover composition and semiconductor circuit e...
Publication number
20050209118
Publication date
Sep 22, 2005
Hiroshi Kawamoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist residue remover composition
Publication number
20040002020
Publication date
Jan 1, 2004
Takuo Oowada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Post-CMP washing liquid composition
Publication number
20030216270
Publication date
Nov 20, 2003
Yumiko Abe
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Photoresist residue removing liquid composition
Publication number
20030143495
Publication date
Jul 31, 2003
Norio Ishikawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY