Takuro KOSAKA

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, and method for manufacturing reflective mask
- Patent number 12,265,321
- Issue date Apr 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, manufacturing method of phase shift mask, a...
- Patent number 12,197,121
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with film for reflective mask blank, reflective mask blan...
- Patent number 12,124,162
- Issue date Oct 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank, method of manufacturing thereof, and reflect...
- Patent number 12,050,396
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,860,529
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,835,851
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing reflective mask blank, and reflective mask...
- Patent number 11,789,357
- Issue date Oct 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift-type photomask blank, method of manufacturing...
- Patent number 11,644,743
- Issue date May 9, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, manufacturing method thereof, and phase shi...
- Patent number 11,644,742
- Issue date May 9, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, method for producing phase shift mask, and...
- Patent number 11,422,456
- Issue date Aug 23, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing reflective mask blank, reflective mask blan...
- Patent number 11,415,874
- Issue date Aug 16, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, manufacturing method thereof, and phase shi...
- Patent number 11,333,965
- Issue date May 17, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 11,327,393
- Issue date May 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase shift mask blank and phase shift mask
- Patent number 11,307,490
- Issue date Apr 19, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask blank making method, and photomask makin...
- Patent number 11,073,756
- Issue date Jul 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and making method
- Patent number 11,061,319
- Issue date Jul 13, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,989,999
- Issue date Apr 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, making method, and halftone p...
- Patent number 10,859,904
- Issue date Dec 8, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and photomask
- Patent number 10,782,609
- Issue date Sep 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryoken Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 10,678,125
- Issue date Jun 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, making method, and halftone p...
- Patent number 10,670,957
- Issue date Jun 2, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank, and preparation method thereof
- Patent number 10,656,516
- Issue date May 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, and preparation method thereof
- Patent number 10,564,537
- Issue date Feb 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and blank preparing method
- Patent number 10,545,401
- Issue date Jan 28, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,466,583
- Issue date Nov 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 10,459,333
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,372,030
- Issue date Aug 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 10,146,122
- Issue date Dec 4, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and blank preparing method
- Patent number 10,078,260
- Issue date Sep 18, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and pat...
- Patent number 9,927,695
- Issue date Mar 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20250138411
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...
- Publication number 20250138410
- Publication date May 1, 2025
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060658
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250060659
- Publication date Feb 20, 2025
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20240337916
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20240248388
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK
- Publication number 20240210812
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Mask Blank, Reflective Mask, and Manufacturing Method Th...
- Publication number 20240210813
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20240077797
- Publication date Mar 7, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND REFLECTIVE MASK
- Publication number 20230152680
- Publication date May 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20230104571
- Publication date Apr 6, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220404694
- Publication date Dec 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220350234
- Publication date Nov 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, MANUFACTURING METHOD THEREOF, AND PHASE SHI...
- Publication number 20220236638
- Publication date Jul 28, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, MANUFACTURING METHOD OF PHASE SHIFT MASK, A...
- Publication number 20220137502
- Publication date May 5, 2022
- Shin-Etsu Chemical Co., Ltd.
- Shohei MIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, METHOD FOR PRODUCING PHASE SHIFT MASK, AND...
- Publication number 20220082929
- Publication date Mar 17, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075254
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075255
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20210333702
- Publication date Oct 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING THEREOF, AND REFLECT...
- Publication number 20210318607
- Publication date Oct 14, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...
- Publication number 20210278759
- Publication date Sep 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT-TYPE PHOTOMASK BLANK, METHOD OF MANUFACTURING...
- Publication number 20210096455
- Publication date Apr 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20210080819
- Publication date Mar 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK
- Publication number 20200310241
- Publication date Oct 1, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, MANUFACTURING METHOD THEREOF, AND PHASE SHI...
- Publication number 20200310240
- Publication date Oct 1, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20200264502
- Publication date Aug 20, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...
- Publication number 20200249561
- Publication date Aug 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHASE SHIFT-TYPE PHOTOMASK BLANK AND PHASE SHIFT-TYPE PHOTOMASK
- Publication number 20200096856
- Publication date Mar 26, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20200026181
- Publication date Jan 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD
- Publication number 20190064650
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Takuro KOSAKA

Person

Patents Grantslast 30 patents

Reflective mask blank, and method for manufacturing reflective mask

Phase shift mask blank, manufacturing method of phase shift mask, a...

Substrate with film for reflective mask blank, reflective mask blan...

Reflective mask blank, method of manufacturing thereof, and reflect...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Method of manufacturing reflective mask blank, and reflective mask...

Halftone phase shift-type photomask blank, method of manufacturing...

Phase shift mask blank, manufacturing method thereof, and phase shi...

Phase shift mask blank, method for producing phase shift mask, and...

Method of manufacturing reflective mask blank, reflective mask blan...

Phase shift mask blank, manufacturing method thereof, and phase shi...

Photomask blank and method for preparing photomask

Phase shift mask blank and phase shift mask

Photomask blank, photomask blank making method, and photomask makin...

Photomask blank and making method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank, making method, and halftone p...

Photomask blank and photomask

Photomask blank and method for preparing photomask

Halftone phase shift photomask blank, making method, and halftone p...

Photomask blank, and preparation method thereof

Photomask blank, and preparation method thereof

Phase shift mask blank, phase shift mask, and blank preparing method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank and making method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank and making method

Phase shift mask blank, phase shift mask, and blank preparing method

Halftone phase shift mask blank, halftone phase shift mask, and pat...

Patents Applicationslast 30 patents

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

REFLECTIVE PHOTOMASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE...

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

REFLECTIVE MASK BLANK, AND MANUFACTURING METHOD OF REFLECTIVE MASK

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

REFLECTIVE MASK BLANK

Reflective Mask Blank, Reflective Mask, and Manufacturing Method Th...

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

REFLECTIVE MASK BLANK, AND REFLECTIVE MASK

SUBSTRATE WITH FILM FOR REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

PHASE SHIFT MASK BLANK, MANUFACTURING METHOD THEREOF, AND PHASE SHI...

PHASE SHIFT MASK BLANK, MANUFACTURING METHOD OF PHASE SHIFT MASK, A...

PHASE SHIFT MASK BLANK, METHOD FOR PRODUCING PHASE SHIFT MASK, AND...

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING THEREOF, AND REFLECT...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...

HALFTONE PHASE SHIFT-TYPE PHOTOMASK BLANK, METHOD OF MANUFACTURING...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK

PHASE SHIFT MASK BLANK, MANUFACTURING METHOD THEREOF, AND PHASE SHI...

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...

PHASE SHIFT-TYPE PHOTOMASK BLANK AND PHASE SHIFT-TYPE PHOTOMASK

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD