Takuya Ikeda

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 12,111,574
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,111,573
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
- Patent number 11,635,686
- Issue date Apr 25, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, method of forming resist pattern, and compound
- Patent number 11,460,770
- Issue date Oct 4, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, and method of forming resist pattern
- Patent number 11,256,169
- Issue date Feb 22, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 11,221,557
- Issue date Jan 11, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,099,479
- Issue date Aug 24, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 11,061,329
- Issue date Jul 13, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
- Patent number 10,908,502
- Issue date Feb 2, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition, method of forming resist pattern, compound, and...
- Patent number 10,649,330
- Issue date May 12, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi Arai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of preparing polymer compound
- Patent number 10,414,918
- Issue date Sep 17, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka Komuro
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photobase generator
- Patent number 9,933,701
- Issue date Apr 3, 2018
- San-Apro Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium salt and photo-acid generator
- Patent number 9,045,398
- Issue date Jun 2, 2015
- San-Apro Limited
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Indanol derivative
- Patent number 7,365,067
- Issue date Apr 29, 2008
- Sankyo Company, Limited
- Takahide Nishi
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
- Publication number 20240302741
- Publication date Sep 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Shuichi Ishii
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...
- Publication number 20240295812
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi Miyakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20220206384
- Publication date Jun 30, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20220206385
- Publication date Jun 30, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210200088
- Publication date Jul 1, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiaki YATSUNAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210157234
- Publication date May 27, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Rin Odashima
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20210063878
- Publication date Mar 4, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi Nagamine
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20200174365
- Publication date Jun 4, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
- Publication number 20200174366
- Publication date Jun 4, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20190361345
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
- Publication number 20190361346
- Publication date Nov 28, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190219920
- Publication date Jul 18, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takashi NAGAMINE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190163057
- Publication date May 30, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya IKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
- Publication number 20190107779
- Publication date Apr 11, 2019
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CURABLE COMPOSITION AND CURED ARTICLE USING SAME
- Publication number 20180329297
- Publication date Nov 15, 2018
- SAN-APRO LTD.
- Noriya Fukunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
- Publication number 20180149973
- Publication date May 31, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Masatoshi ARAI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF PREPARING POLYMER COMPOUND
- Publication number 20180022916
- Publication date Jan 25, 2018
- Tokyo Ohka Kogyo Co., Ltd.
- Yoshitaka KOMURO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY
- Publication number 20160368879
- Publication date Dec 22, 2016
- SAN-APRO LTD.
- Takuya IKEDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOBASE GENERATOR
- Publication number 20160299429
- Publication date Oct 13, 2016
- SAN-APRO LTD.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOBASE GENERATOR
- Publication number 20160009737
- Publication date Jan 14, 2016
- SAN-APRO LTD.
- Takuya Ikeda
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SULFONIUM SALT AND PHOTO-ACID GENERATOR
- Publication number 20140357896
- Publication date Dec 4, 2014
- SAN-APRO LTD.
- Issei Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Indanol derivative
- Publication number 20070197570
- Publication date Aug 23, 2007
- SANKYO COMPANY, LIMITED
- Takahide Nishi
- C07 - ORGANIC CHEMISTRY

Takuya Ikeda

Person

Patents Grantslast 30 patents

Resist composition, method of forming resist pattern, compound, and...

Resist composition and method of forming resist pattern

Resist composition, method of forming resist pattern, and compound

Resist composition, method of forming resist pattern, and compound

Resist composition, and method of forming resist pattern

Resist composition, method of forming resist pattern, compound, and...

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, polymeric com...

Resist composition, method of forming resist pattern, compound, and...

Method of preparing polymer compound

Photobase generator

Sulfonium salt and photo-acid generator

Indanol derivative

Patents Applicationslast 30 patents

RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...

CURABLE COMPOSITION AND CURED ARTICLE USING SAME

RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...

METHOD OF PREPARING POLYMER COMPOUND

PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY

PHOTOBASE GENERATOR

PHOTOBASE GENERATOR

SULFONIUM SALT AND PHOTO-ACID GENERATOR

Indanol derivative