Takuya Kamiyama

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Hydrogenated silane composition
- Patent number 10,676,366
- Issue date Jun 9, 2020
- Nippon Shokubai Co., Ltd.
- Takashi Abe
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Composition for chemical vapor deposition film-formation and method...
- Patent number 8,846,148
- Issue date Sep 30, 2014
- Nippon Shokubai Co., Ltd.
- Teruhiko Kumada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulating film for semiconductor device, process and apparatus for...
- Patent number 8,288,294
- Issue date Oct 16, 2012
- Mitsubishi Heavy Industries, Ltd.
- Hidetaka Kafuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for low dielectric material, low dielectric material an...
- Patent number 7,824,784
- Issue date Nov 2, 2010
- Mitsubishi Denki Kabushiki Kaisha
- Teruhiko Kumada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing borazine compound
- Patent number 7,786,324
- Issue date Aug 31, 2010
- Nippon Shokubai Co., Ltd.
- Tetsuya Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing borazine compound
- Patent number 7,692,043
- Issue date Apr 6, 2010
- Nippon Shokubai Co., Ltd.
- Tetsuya Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Alkylborazine compound and production method for the same
- Patent number 7,208,627
- Issue date Apr 24, 2007
- Nippon Shokubai Co., Ltd.
- Tetsuya Yamamoto
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
HYDROGENATED SILANE COMPOSITION
- Publication number 20190135642
- Publication date May 9, 2019
- NIPPON SHOKUBAI CO., LTD
- Takashi ABE
- C01 - INORGANIC CHEMISTRY
Information Patent Application
INSULATING FILM FOR SEMICONDUCTOR DEVICE, PROCESS AND APPARATUS FOR...
- Publication number 20110266660
- Publication date Nov 3, 2011
- Mitsubishi Electric Corporation
- Hidetaka Kafuku
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, INSULATING FILM FOR S...
- Publication number 20100181654
- Publication date Jul 22, 2010
- Mitsubishi Heavy Industries, Ltd.
- Toshihito Fujiwara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition for Chemical Vapor Deposition Film-Formation and Method...
- Publication number 20090232987
- Publication date Sep 17, 2009
- Nippon Shokubai Co., Ltd.
- Teruhiko Kumada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR LOW DIELECTRIC MATERIAL, LOW DIELECTRIC MATERIAL AN...
- Publication number 20090090274
- Publication date Apr 9, 2009
- Teruhiko Kumada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING BORAZINE COMPOUND
- Publication number 20080045750
- Publication date Feb 21, 2008
- NIPPON SHOKUBAI CO., LTD
- Tetsuya Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Method for producing borazine compound
- Publication number 20060178535
- Publication date Aug 10, 2006
- NIPPON SHOKUBAI CO., LTD.
- Tetsuya Yamamoto
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Composition for low dielectric material, low dielectric material an...
- Publication number 20050282015
- Publication date Dec 22, 2005
- Teruhiko Kumada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Alkylborazine compound and production method for the same
- Publication number 20050177002
- Publication date Aug 11, 2005
- Tetsuya Yamamoto
- C07 - ORGANIC CHEMISTRY

Takuya Kamiyama

Person

Patents Grantslast 30 patents

Hydrogenated silane composition

Composition for chemical vapor deposition film-formation and method...

Insulating film for semiconductor device, process and apparatus for...

Composition for low dielectric material, low dielectric material an...

Method for producing borazine compound

Method for producing borazine compound

Alkylborazine compound and production method for the same

Patents Applicationslast 30 patents

HYDROGENATED SILANE COMPOSITION

INSULATING FILM FOR SEMICONDUCTOR DEVICE, PROCESS AND APPARATUS FOR...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, INSULATING FILM FOR S...

Composition for Chemical Vapor Deposition Film-Formation and Method...

COMPOSITION FOR LOW DIELECTRIC MATERIAL, LOW DIELECTRIC MATERIAL AN...

METHOD FOR PRODUCING BORAZINE COMPOUND

Method for producing borazine compound

Composition for low dielectric material, low dielectric material an...

Alkylborazine compound and production method for the same