Takuya MORI

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Albany, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Highly selective spacer etch process with reduced sidewall spacer s...
- Patent number 8,664,125
- Issue date Mar 4, 2014
- Tokyo Electron Limited
- Angelique Denise Raley
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HIGHLY SELECTIVE SPACER ETCH PROCESS WITH REDUCED SIDEWALL SPACER S...
- Publication number 20140120728
- Publication date May 1, 2014
- TOKYO ELECTRON LIMITED
- Angelique Denise RALEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGHLY SELECTIVE SPACER ETCH PROCESS WITH REDUCED SIDEWALL SPACER S...
- Publication number 20130164940
- Publication date Jun 27, 2013
- TOKYO ELECTRON LIMITED
- Angélique Denise RALEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20090246965
- Publication date Oct 1, 2009
- TOKYO ELECTRON LIMITED
- Takuya Mori
- H01 - BASIC ELECTRIC ELEMENTS