Takuya OMIYA

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Tokyo, JP

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Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIN, COMPOUND, AND PATTERN...
- Publication number 20240385518
- Publication date Nov 21, 2024
- JSR Corporation
- Katsuaki NISHIKORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20230400767
- Publication date Dec 14, 2023
- JSR Corporation
- Takuya OMIYA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, P...
- Publication number 20230384676
- Publication date Nov 30, 2023
- JSR Corporation
- Takuya OMIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230104260
- Publication date Apr 6, 2023
- JSR Corporation
- Takuya OMIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY