Takuya Sugawara

Person

Nirasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method, film forming apparatus, and storage medium
- Patent number 8,735,304
- Issue date May 27, 2014
- Elpida Memory Inc.
- Yuichiro Morozumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Alteration method and alteration apparatus for titanium nitride
- Patent number 8,409,961
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 8,336,487
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Yoshihiro Ishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 7,968,472
- Issue date Jun 28, 2011
- Tokyo Electron Limited
- Yoshihiro Ishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method of fin-type field effect transistor
- Patent number 7,955,922
- Issue date Jun 7, 2011
- Tokyo Electron Limited
- Hajime Nakabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and production method for semiconductor d...
- Patent number 7,759,598
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulation film
- Patent number 7,662,236
- Issue date Feb 16, 2010
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming underlying insulation film
- Patent number 7,622,402
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material for electronic device and process for producing the same
- Patent number 7,560,396
- Issue date Jul 14, 2009
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method
- Patent number 7,517,751
- Issue date Apr 14, 2009
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulation film
- Patent number 7,446,052
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitriding method of gate oxide film
- Patent number 7,429,539
- Issue date Sep 30, 2008
- Tokyo Electron Limited
- Seiji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and material for electronic device
- Patent number 7,250,375
- Issue date Jul 31, 2007
- Tokyo Electron Limited
- Toshio Nakanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 7,232,772
- Issue date Jun 19, 2007
- Tokyo Electron Limited
- Seiji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating method and production method for semiconductor d...
- Patent number 7,226,848
- Issue date Jun 5, 2007
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 7,226,874
- Issue date Jun 5, 2007
- Tokyo Electron Limited
- Seiji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing materials for electronic device
- Patent number 7,217,659
- Issue date May 15, 2007
- Tokyo Electron Limited
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for modifying a gate dielectric stack containing...
- Patent number 7,163,877
- Issue date Jan 16, 2007
- Tokyo Electron Limited
- Hiroaki Niimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing electronic device material
- Patent number 6,897,149
- Issue date May 24, 2005
- Tokyo Electron Limited
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
MOCVD method of tantalum oxide film
- Patent number 6,313,047
- Issue date Nov 6, 2001
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING METHOD, FILM FORMING APPARATUS, AND STORAGE MEDIUM
- Publication number 20120244721
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Yuichiro MOROZUMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20110197813
- Publication date Aug 18, 2011
- TOKYO ELECTRON LIMITED
- Yoshihiro Ishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ALTERATION METHOD AND ALTERATION APPARATUS FOR TITANIUM NITRIDE
- Publication number 20110124175
- Publication date May 26, 2011
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20100096707
- Publication date Apr 22, 2010
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE
- Publication number 20100068896
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Takuya SUGAWARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20100035439
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Yoshihiro Ishida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Treating Method
- Publication number 20090163036
- Publication date Jun 25, 2009
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDING METHOD OF GATE OXIDE FILM
- Publication number 20090035950
- Publication date Feb 5, 2009
- TOKYO ELECTRON LIMITED
- Seijii Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Forming Insulation Film
- Publication number 20080274370
- Publication date Nov 6, 2008
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF FIN-TYPE FIELD EFFECT TRANSISTOR
- Publication number 20080171407
- Publication date Jul 17, 2008
- TOKYO ELECTRON LIMITED
- Hajime Nakabayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treating method and production method for semiconductor d...
- Publication number 20070235421
- Publication date Oct 11, 2007
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing material of electronic device
- Publication number 20070224837
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for producing materials for electronic device
- Publication number 20070218687
- Publication date Sep 20, 2007
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND MATERIAL FOR ELECTRONIC DEVICE
- Publication number 20070204959
- Publication date Sep 6, 2007
- TOKYO ELECTRON LTD.
- Toshio NAKANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NITRIDING METHOD OF GATE OXIDE FILM
- Publication number 20070134895
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- Seijii Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material for electronic device and process for producing the same
- Publication number 20060046503
- Publication date Mar 2, 2006
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for modifying a gate dielectric stack containing...
- Publication number 20060040483
- Publication date Feb 23, 2006
- TOKYO ELECTRON LIMITED
- Hiroaki Niimi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming underlying insulation film
- Publication number 20050255711
- Publication date Nov 17, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing material of electronic device
- Publication number 20050233599
- Publication date Oct 20, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for producing material of electronic device
- Publication number 20050227500
- Publication date Oct 13, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for producing materials for electronic device
- Publication number 20050176263
- Publication date Aug 11, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing method
- Publication number 20050176223
- Publication date Aug 11, 2005
- TOKYO ELECTRON LIMITED
- Seijii Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treating method and production method for semiconductor d...
- Publication number 20050170543
- Publication date Aug 4, 2005
- Tokyo Electron Limited
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming insulation film
- Publication number 20050161434
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treating method
- Publication number 20050164523
- Publication date Jul 28, 2005
- TOKYO ELECTRON LIMITED
- Takuya Sugawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing method
- Publication number 20050153570
- Publication date Jul 14, 2005
- TOKYO ELECTRON LIMITED
- Seijii Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Base method treating method and electron device-use material
- Publication number 20040235311
- Publication date Nov 25, 2004
- Toshio Nakanishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for producing material of electronic device
- Publication number 20040142577
- Publication date Jul 22, 2004
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of producing electronic device material
- Publication number 20040048452
- Publication date Mar 11, 2004
- Takuya Sugawara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MOCVD method of tantalum oxide film
- Publication number 20010027031
- Publication date Oct 4, 2001
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Takuya Sugawara

Person

Patents Grantslast 30 patents

Film forming method, film forming apparatus, and storage medium

Alteration method and alteration apparatus for titanium nitride

Film forming apparatus

Film forming method and film forming apparatus

Manufacturing method of fin-type field effect transistor

Substrate treating method and production method for semiconductor d...

Method for forming insulation film

Method for forming underlying insulation film

Material for electronic device and process for producing the same

Substrate treating method

Method for forming insulation film

Nitriding method of gate oxide film

Substrate processing method and material for electronic device

Substrate processing method

Substrate treating method and production method for semiconductor d...

Substrate processing method

Process for producing materials for electronic device

Method and system for modifying a gate dielectric stack containing...

Method of producing electronic device material

MOCVD method of tantalum oxide film

Patents Applicationslast 30 patents

FILM FORMING METHOD, FILM FORMING APPARATUS, AND STORAGE MEDIUM

FILM FORMING APPARATUS

ALTERATION METHOD AND ALTERATION APPARATUS FOR TITANIUM NITRIDE

Method for Forming Insulation Film

METHOD OF PROCESSING SUBSTRATE

FILM FORMING METHOD AND FILM FORMING APPARATUS

Substrate Treating Method

NITRIDING METHOD OF GATE OXIDE FILM

Method for Forming Insulation Film

MANUFACTURING METHOD OF FIN-TYPE FIELD EFFECT TRANSISTOR

Substrate treating method and production method for semiconductor d...

Method for producing material of electronic device

Process for producing materials for electronic device

SUBSTRATE PROCESSING METHOD AND MATERIAL FOR ELECTRONIC DEVICE

NITRIDING METHOD OF GATE OXIDE FILM

Material for electronic device and process for producing the same

Method and system for modifying a gate dielectric stack containing...

Method for forming underlying insulation film

Method for producing material of electronic device

Method for producing material of electronic device

Process for producing materials for electronic device

Substrate processing method

Substrate treating method and production method for semiconductor d...

Method for forming insulation film

Substrate treating method

Substrate processing method

Base method treating method and electron device-use material

Method for producing material of electronic device

Method of producing electronic device material

MOCVD method of tantalum oxide film