Tal Itzkovich

Person

Kfar Uria, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compound imaging metrology targets
- Patent number 10,527,951
- Issue date Jan 7, 2020
- KLA-Tencor Corporation
- Raviv Yohanan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct self assembly in target design and...
- Patent number 10,303,835
- Issue date May 28, 2019
- KLA-Tencor Corporation
- Eran Amit
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Analyzing root causes of process variation in scatterometry metrology
- Patent number 10,203,200
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Feed forward of metrology data in a metrology system
- Patent number 9,903,711
- Issue date Feb 27, 2018
- KLA-Tencor Corporation
- Ady Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid imaging and scatterometry targets
- Patent number 9,476,838
- Issue date Oct 25, 2016
- KLA-Tencor Corporation
- DongSub Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device correlated metrology (DCM) for OVL with embedded SEM structu...
- Patent number 9,093,458
- Issue date Jul 28, 2015
- KLA-Tencor Corporation
- Nuriel Amir
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Analyzing Root Causes of Process Variation in Scatterometry Metrology
- Publication number 20180023950
- Publication date Jan 25, 2018
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
Feed Forward of Metrology Data in a Metrology System
- Publication number 20160290796
- Publication date Oct 6, 2016
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
COMPOUND IMAGING METROLOGY TARGETS
- Publication number 20160179017
- Publication date Jun 23, 2016
- KLA-Tencor Corporation
- Raviv YOHANAN
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR DIRECT SELF ASSEMBLY IN TARGET DESIGN AND...
- Publication number 20150242558
- Publication date Aug 27, 2015
- KLA-Tencor Corporation
- Eran AMIT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
HYBRID IMAGING AND SCATTEROMETRY TARGETS
- Publication number 20140375984
- Publication date Dec 25, 2014
- DongSub Choi
- G01 - MEASURING TESTING
Information Patent Application
DEVICE CORRELATED METROLOGY (DCM) FOR OVL WITH EMBEDDED SEM STRUCTU...
- Publication number 20140065736
- Publication date Mar 6, 2014
- KLA-Tencor Corporation
- Nuriel Amir
- H01 - BASIC ELECTRIC ELEMENTS

Tal Itzkovich

Person

Patents Grantslast 30 patents

Process compatibility improvement by fill factor modulation

Compound imaging metrology targets

Method and apparatus for direct self assembly in target design and...

Analyzing root causes of process variation in scatterometry metrology

Feed forward of metrology data in a metrology system

Hybrid imaging and scatterometry targets

Device correlated metrology (DCM) for OVL with embedded SEM structu...

Patents Applicationslast 30 patents

Process Compatibility Improvement by Fill Factor Modulation

Analyzing Root Causes of Process Variation in Scatterometry Metrology

Feed Forward of Metrology Data in a Metrology System

COMPOUND IMAGING METROLOGY TARGETS

METHOD AND APPARATUS FOR DIRECT SELF ASSEMBLY IN TARGET DESIGN AND...

HYBRID IMAGING AND SCATTEROMETRY TARGETS

DEVICE CORRELATED METROLOGY (DCM) FOR OVL WITH EMBEDDED SEM STRUCTU...