Tal Marciano

Person

Yokneam, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for metrology optimization based on metrology l...
- Patent number 11,725,934
- Issue date Aug 15, 2023
- Dana Klein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scaling metric for quantifying metrology sensitivity to process var...
- Patent number 11,333,982
- Issue date May 17, 2022
- KLA Corporation
- Tal Marciano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Per-site residuals analysis for accurate metrology measurements
- Patent number 11,249,400
- Issue date Feb 15, 2022
- KLA Corporation
- Lilach Saltoun
- G01 - MEASURING TESTING
Information Patent Grant
Expediting spectral measurement in semiconductor device fabrication
- Patent number 11,237,120
- Issue date Feb 1, 2022
- KLA-Tencor Corporation
- Vincent Immer
- G01 - MEASURING TESTING
Information Patent Grant
Estimating amplitude and phase asymmetry in imaging technology for...
- Patent number 10,866,090
- Issue date Dec 15, 2020
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Method of analyzing and utilizing landscapes to reduce or eliminate...
- Patent number 10,831,108
- Issue date Nov 10, 2020
- KLA Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Expediting spectral measurement in semiconductor device fabrication
- Patent number 10,761,034
- Issue date Sep 1, 2020
- KLA-Tencor Corporation
- Vincent Immer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Estimating and eliminating inter-cell process variation inaccuracy
- Patent number 10,415,963
- Issue date Sep 17, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Identifying process variations during product manufacture
- Patent number 10,379,449
- Issue date Aug 13, 2019
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Three-dimensional mapping of a wafer
- Patent number 10,317,198
- Issue date Jun 11, 2019
- KLA-Tencor Corporation
- Vincent Sebastian Immer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Analyzing root causes of process variation in scatterometry metrology
- Patent number 10,203,200
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Feed forward of metrology data in a metrology system
- Patent number 9,903,711
- Issue date Feb 27, 2018
- KLA-Tencor Corporation
- Ady Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Systems and Methods for Metrology Optimization Based on Metrology L...
- Publication number 20220364855
- Publication date Nov 17, 2022
- KLA Corporation
- Dana Klein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PER-SITE RESIDUALS ANALYSIS FOR ACCURATE METROLOGY MEASUREMENTS
- Publication number 20200371445
- Publication date Nov 26, 2020
- KLA Corporation
- Lilach Saltoun
- G01 - MEASURING TESTING
Information Patent Application
Scaling Metric for Quantifying Metrology Sensitivity to Process Var...
- Publication number 20200241428
- Publication date Jul 30, 2020
- KLA Corporation
- Tal Marciano
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Estimating Amplitude and Phase Asymmetry in Imaging Technology for...
- Publication number 20200132445
- Publication date Apr 30, 2020
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
IDENTIFYING PROCESS VARIATIONS DURING PRODUCT MANUFACTURE
- Publication number 20190033730
- Publication date Jan 31, 2019
- KLA-Tencor Corporation
- Tzahi GRUNZWEIG
- G01 - MEASURING TESTING
Information Patent Application
Expediting Spectral Measurement in Semiconductor Device Fabrication
- Publication number 20180372652
- Publication date Dec 27, 2018
- KLA-Tencor Corporation
- Vincent Immer
- G02 - OPTICS
Information Patent Application
Three-Dimensional Mapping of a Wafer
- Publication number 20180245910
- Publication date Aug 30, 2018
- KLA-Tencor Corporation
- Vincent Sebastian Immer
- G01 - MEASURING TESTING
Information Patent Application
Analyzing Root Causes of Process Variation in Scatterometry Metrology
- Publication number 20180023950
- Publication date Jan 25, 2018
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...
- Publication number 20160313658
- Publication date Oct 27, 2016
- KLA-Tencor Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feed Forward of Metrology Data in a Metrology System
- Publication number 20160290796
- Publication date Oct 6, 2016
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY
- Publication number 20150292877
- Publication date Oct 15, 2015
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING

Tal Marciano

Person

Patents Grantslast 30 patents

Systems and methods for metrology optimization based on metrology l...

Scaling metric for quantifying metrology sensitivity to process var...

Per-site residuals analysis for accurate metrology measurements

Expediting spectral measurement in semiconductor device fabrication

Estimating amplitude and phase asymmetry in imaging technology for...

Method of analyzing and utilizing landscapes to reduce or eliminate...

Expediting spectral measurement in semiconductor device fabrication

Estimating and eliminating inter-cell process variation inaccuracy

Identifying process variations during product manufacture

Three-dimensional mapping of a wafer

Analyzing root causes of process variation in scatterometry metrology

Feed forward of metrology data in a metrology system

Patents Applicationslast 30 patents

Systems and Methods for Metrology Optimization Based on Metrology L...

PER-SITE RESIDUALS ANALYSIS FOR ACCURATE METROLOGY MEASUREMENTS

Scaling Metric for Quantifying Metrology Sensitivity to Process Var...

Estimating Amplitude and Phase Asymmetry in Imaging Technology for...

IDENTIFYING PROCESS VARIATIONS DURING PRODUCT MANUFACTURE

Expediting Spectral Measurement in Semiconductor Device Fabrication

Three-Dimensional Mapping of a Wafer

Analyzing Root Causes of Process Variation in Scatterometry Metrology

METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...

Feed Forward of Metrology Data in a Metrology System

ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY