TAMAMUSHI SHUICHI

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Hwaseong-si, KR

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Patents Grantslast 30 patents

Information Patent Grant
Aperture system of electron beam apparatus, electron beam exposure...
- Patent number 10,497,534
- Issue date Dec 3, 2019
- Samsung Electronics Co., Ltd.
- Hyun Ho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems including a beam projection device providing variable expos...
- Patent number 10,115,562
- Issue date Oct 30, 2018
- Samsung Electronics Co., Ltd.
- Suyoung Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of correcting mask pattern and method of manufacturing reticle
- Patent number 10,012,900
- Issue date Jul 3, 2018
- Samsung Electronics Co., Ltd.
- Jong-su Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method using electron beam and substrate manufacturing met...
- Patent number 9,709,893
- Issue date Jul 18, 2017
- Samsung Electronics Co., Ltd.
- Sook Hyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method using control of settling times and methods of manu...
- Patent number 9,583,305
- Issue date Feb 28, 2017
- Samsung Electronics Co., Ltd.
- Yong-Seok Jung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APERTURE SYSTEM OF ELECTRON BEAM APPARATUS, ELECTRON BEAM EXPOSURE...
- Publication number 20190180972
- Publication date Jun 13, 2019
- Samsung Electronics Co., Ltd.
- Hyun Ho LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS INCLUDING A BEAM PROJECTION DEVICE PROVIDING VARIABLE EXPOS...
- Publication number 20170133199
- Publication date May 11, 2017
- Samsung Electronics Co., Ltd.
- SUYOUNG LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CORRECTING MASK PATTERN AND METHOD OF MANUFACTURING RETICLE
- Publication number 20170082921
- Publication date Mar 23, 2017
- Samsung Electronics Co., Ltd.
- Jong-su KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD USING ELECTRON BEAM AND SUBSTRATE MANUFACTURING MET...
- Publication number 20160223903
- Publication date Aug 4, 2016
- Samsung Electronics Co., Ltd.
- SOOK HYUN LEE
- G02 - OPTICS
Information Patent Application
EXPOSURE METHOD USING CONTROL OF SETTLING TIMES AND METHODS OF MANU...
- Publication number 20150311032
- Publication date Oct 29, 2015
- Samsung Electronics Co., Ltd.
- Yong-Seok JUNG
- H01 - BASIC ELECTRIC ELEMENTS