Tamarak Pandhumsoporn

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing system including coil with RF powered faraday...
- Patent number 12,087,557
- Issue date Sep 10, 2024
- Lam Research Corporation
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Edge ring assembly for improving feature profile tilting at extreme...
- Patent number 10,854,492
- Issue date Dec 1, 2020
- Lam Research Corporation
- William Frederick Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Minimization of mask undercut on deep silicon etch
- Patent number 8,262,920
- Issue date Sep 11, 2012
- Lam Research Corporation
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Notch stop pulsing process for plasma processing system
- Patent number 7,985,688
- Issue date Jul 26, 2011
- Lam Research Corporation
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for sequentially alternating among plasma pro...
- Patent number 7,459,100
- Issue date Dec 2, 2008
- Lam Research Corporation
- Adrian Kiermasz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for minimizing mask undercuts and notches for plasma proces...
- Patent number 7,351,664
- Issue date Apr 1, 2008
- Lam Research Corporation
- Tamarak Pandhumsoporn
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Method of anisotropic etching of substrates
- Patent number 6,383,938
- Issue date May 7, 2002
- Alcatel
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recessed bonding of target for RF diode sputtering
- Patent number 6,287,437
- Issue date Sep 11, 2001
- Alcatel
- Tamarak Pandhumsoporn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Components and Processes for Managing Plasma Process Byproduct Mate...
- Publication number 20210225616
- Publication date Jul 22, 2021
- LAM RESEARCH CORPORATION
- Gordon Wen-Yin Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ASSEMBLY FOR IMPROVING FEATURE PROFILE TILTING AT EXTREME...
- Publication number 20170053820
- Publication date Feb 23, 2017
- LAM RESEARCH CORPORATION
- William Frederick Bosch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MINIMIZATION OF MASK UNDERCUT ON DEEP ETCH
- Publication number 20120298301
- Publication date Nov 29, 2012
- LAM RESEARCH CORPORATION
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Minimization of mask undercut on deep silicon etch
- Publication number 20080308526
- Publication date Dec 18, 2008
- Lam Research Corporation
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR MINIMIZING MASK UNDERCUTS AND NOTCHES FOR PLASMA PROCES...
- Publication number 20070281489
- Publication date Dec 6, 2007
- Tamarak Pandhumsoporn
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Notch stop pulsing process for plasma processing system
- Publication number 20070141847
- Publication date Jun 21, 2007
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for sequentially alternating among plasma pro...
- Publication number 20060131271
- Publication date Jun 22, 2006
- Adrian Kiermasz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of processing a substrate with minimal scalloping
- Publication number 20050211668
- Publication date Sep 29, 2005
- LAM RESEARCH CORPORATION
- Tamarak Pandhumsoporn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ANISOTROPIC ETCHING OF SUBSTRATES
- Publication number 20010044213
- Publication date Nov 22, 2001
- TAMARAK PANDHUMSOPORN
- H01 - BASIC ELECTRIC ELEMENTS

Tamarak Pandhumsoporn

Person

Patents Grantslast 30 patents

Substrate processing system including coil with RF powered faraday...

Edge ring assembly for improving feature profile tilting at extreme...

Minimization of mask undercut on deep silicon etch

Notch stop pulsing process for plasma processing system

Methods and apparatus for sequentially alternating among plasma pro...

Methods for minimizing mask undercuts and notches for plasma proces...

Method of anisotropic etching of substrates

Recessed bonding of target for RF diode sputtering

Patents Applicationslast 30 patents

Components and Processes for Managing Plasma Process Byproduct Mate...

EDGE RING ASSEMBLY FOR IMPROVING FEATURE PROFILE TILTING AT EXTREME...

MINIMIZATION OF MASK UNDERCUT ON DEEP ETCH

Minimization of mask undercut on deep silicon etch

METHODS FOR MINIMIZING MASK UNDERCUTS AND NOTCHES FOR PLASMA PROCES...

Notch stop pulsing process for plasma processing system

Methods and apparatus for sequentially alternating among plasma pro...

Methods of processing a substrate with minimal scalloping

METHOD OF ANISOTROPIC ETCHING OF SUBSTRATES