Tammy Zheng

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optimized gate implants for reducing dopant effects during gate etc...
- Patent number 6,822,291
- Issue date Nov 23, 2004
- Koninklijke Philips Electronics N.V.
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch process that resists notching at electrode bottom
- Patent number 6,794,294
- Issue date Sep 21, 2004
- Koninklijke Philips Electronics N.V.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to control etch profiles in dual-implanted silicon films
- Patent number 6,605,543
- Issue date Aug 12, 2003
- Koninklijke Philips Electronics N.V.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized gate implants for reducing dopant effects during gate etc...
- Patent number 6,541,359
- Issue date Apr 1, 2003
- Koninklijke Philips Electronics N.V.
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hard mask process to control etch profiles in a gate stack
- Patent number 6,475,922
- Issue date Nov 5, 2002
- Koninklijke Philips Electronics N.V.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process to control poly silicon profiles in a dual doped poly silic...
- Patent number 6,399,432
- Issue date Jun 4, 2002
- Philips Semiconductors Inc.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for a consistent shallow trench etch profile
- Patent number 6,342,428
- Issue date Jan 29, 2002
- Philips Electronics North America Corp.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Intelligent gate-level fill methods for reducing global pattern den...
- Patent number 6,323,113
- Issue date Nov 27, 2001
- Philips Electronics North America Corporation
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for endpoint detection during dry etch of submicron features...
- Patent number 6,306,755
- Issue date Oct 23, 2001
- KoninKlijke Philips Electronics N.V. (KPENV)
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimized metal etch process to enable the use of aluminum plugs
- Patent number 6,255,226
- Issue date Jul 3, 2001
- Philips Semiconductor, Inc.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of an insulating spacer to prevent threshold voltage roll-off i...
- Patent number 6,251,747
- Issue date Jun 26, 2001
- Philips Semiconductors, Inc.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming metal interconnects with reduced or eliminated...
- Patent number 6,228,757
- Issue date May 8, 2001
- Philips Semiconductors, Inc.
- Samit Sengupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated etch process for polysilicon/metal gate
- Patent number 6,060,376
- Issue date May 9, 2000
- VLSI Technology, Inc.
- Calvin Gabriel
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTELLIGENT UNIFORM MASKS FOR SEMICONDUCTOR FABRICATION
- Publication number 20160161843
- Publication date Jun 9, 2016
- BROADCOM CORPORATION
- Tammy DongLei ZHENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimized gate implants for reducing dopant effects during gate etc...
- Publication number 20030146472
- Publication date Aug 7, 2003
- Calvin Todd Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Device having metal interconnects with reduced or eliminated metal...
- Publication number 20010017416
- Publication date Aug 30, 2001
- VLSI TECHNOLOGY, INC.
- Samit Sengupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optimized metal etch process to enable the use of aluminum plugs
- Publication number 20010012690
- Publication date Aug 9, 2001
- Philips Semiconductors, Inc.
- Tammy Zheng
- H01 - BASIC ELECTRIC ELEMENTS

Tammy Zheng

Person

Patents Grantslast 30 patents

Optimized gate implants for reducing dopant effects during gate etc...

Etch process that resists notching at electrode bottom

Process to control etch profiles in dual-implanted silicon films

Optimized gate implants for reducing dopant effects during gate etc...

Hard mask process to control etch profiles in a gate stack

Process to control poly silicon profiles in a dual doped poly silic...

Method for a consistent shallow trench etch profile

Intelligent gate-level fill methods for reducing global pattern den...

Method for endpoint detection during dry etch of submicron features...

Optimized metal etch process to enable the use of aluminum plugs

Use of an insulating spacer to prevent threshold voltage roll-off i...

Process for forming metal interconnects with reduced or eliminated...

Integrated etch process for polysilicon/metal gate

Patents Applicationslast 30 patents

INTELLIGENT UNIFORM MASKS FOR SEMICONDUCTOR FABRICATION

Optimized gate implants for reducing dopant effects during gate etc...

Device having metal interconnects with reduced or eliminated metal...

Optimized metal etch process to enable the use of aluminum plugs