Tamotsu Maruyama

Person

Niigata, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask blank, photomask and fabrication method thereof
- Patent number 7,771,893
- Issue date Aug 10, 2010
- Shin-Etsu Chemical Co., Ltd.
- Hiroki Yoshikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Phase-shift photomask-blank, phase-shift photomask and fabrication...
- Patent number 7,622,227
- Issue date Nov 24, 2009
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask blank, photomask and method of manufacture
- Patent number 6,733,930
- Issue date May 11, 2004
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 6,727,027
- Issue date Apr 27, 2004
- Shin-Etsu Chemical Co., Ltd.
- Tetsushi Tsukamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and methods of manufacture
- Patent number 6,641,958
- Issue date Nov 4, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and method of manufacture
- Patent number 6,514,642
- Issue date Feb 4, 2003
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shift mask blank, phase shift mask and method of manufacture
- Patent number 6,511,778
- Issue date Jan 28, 2003
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and method of manufacture
- Patent number 6,503,668
- Issue date Jan 7, 2003
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask and method of manufacture
- Patent number 6,503,669
- Issue date Jan 7, 2003
- Shin-Etsu Chemical Co., Ltd.
- Hideo Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shift mask and making process
- Patent number 6,352,801
- Issue date Mar 5, 2002
- Shin-Etsu Chemical Co., Ltd.
- Satoshi Okazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photomask blank, photomask and fabrication method thereof
- Publication number 20070020534
- Publication date Jan 25, 2007
- Hiroki Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift photomask-blank, phase-shift photomask and fabrication...
- Publication number 20060257755
- Publication date Nov 16, 2006
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank, photomask and method of manufacture
- Publication number 20020136966
- Publication date Sep 26, 2002
- Tsutomu Shinagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask blank and photomask
- Publication number 20020115003
- Publication date Aug 22, 2002
- Tetsushi Tsukamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, phase shift mask, and methods of manufacture
- Publication number 20020025478
- Publication date Feb 28, 2002
- Shin-Etsu Shemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask and method of manufacture
- Publication number 20010028982
- Publication date Oct 11, 2001
- Satoshi Okazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Photomask blank, photomask and method of manufacture
- Publication number 20010019801
- Publication date Sep 6, 2001
- Hideo Kaneko
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Phase shift mask blank, phase shift mask, and method of manufacture
- Publication number 20010007731
- Publication date Jul 12, 2001
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, phase shift mask and method of manufacture
- Publication number 20010006754
- Publication date Jul 5, 2001
- Satoshi Okazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Tamotsu Maruyama

Person

Patents Grantslast 30 patents

Photomask blank, photomask and fabrication method thereof

Phase-shift photomask-blank, phase-shift photomask and fabrication...

Photomask blank, photomask and method of manufacture

Photomask blank and photomask

Phase shift mask blank, phase shift mask, and methods of manufacture

Phase shift mask and method of manufacture

Phase shift mask blank, phase shift mask and method of manufacture

Phase shift mask blank, phase shift mask, and method of manufacture

Photomask blank, photomask and method of manufacture

Phase shift mask and making process

Patents Applicationslast 30 patents

Photomask blank, photomask and fabrication method thereof

Phase-shift photomask-blank, phase-shift photomask and fabrication...

Photomask blank, photomask and method of manufacture

Photomask blank and photomask

Phase shift mask blank, phase shift mask, and methods of manufacture

Phase shift mask and method of manufacture

Photomask blank, photomask and method of manufacture

Phase shift mask blank, phase shift mask, and method of manufacture

Phase shift mask blank, phase shift mask and method of manufacture