Tamotsu Morimoto

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate treatment method
- Patent number 10,910,229
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Koichi Nagakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching multilayer film
- Patent number 10,790,152
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Takuya Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching object to be processed
- Patent number 9,947,864
- Issue date Apr 17, 2018
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modification processing method and method of manufacturing semicond...
- Patent number 9,911,596
- Issue date Mar 6, 2018
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modification processing method and method of manufacturing semicond...
- Patent number 9,443,724
- Issue date Sep 13, 2016
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing
- Patent number 8,574,446
- Issue date Nov 5, 2013
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching
- Patent number 6,812,151
- Issue date Nov 2, 2004
- Kenichi Nanbu
- Kenichi Nanbu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of processing an object to be processed
- Patent number 6,793,834
- Issue date Sep 21, 2004
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of processing an object to be processed
- Patent number 6,514,377
- Issue date Feb 4, 2003
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment system
- Patent number 6,322,662
- Issue date Nov 27, 2001
- Tokyo Electron Limited
- Nobuo Ishii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat processing apparatus
- Patent number 5,567,152
- Issue date Oct 22, 1996
- Tokyo Electron Limited
- Tamotsu Morimoto
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQU...
- Publication number 20240420970
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Takao OKABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD
- Publication number 20180366334
- Publication date Dec 20, 2018
- TOKYO ELECTRON LIMITED
- Koichi NAGAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING MULTILAYER FILM
- Publication number 20180190500
- Publication date Jul 5, 2018
- TOKYO ELECTRON LIMITED
- Takuya KUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Nonvolatile Storage Device and Method of Fabricating Nonvolatile St...
- Publication number 20180047787
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Genji NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING OBJECT TO BE PROCESSED
- Publication number 20170200886
- Publication date Jul 13, 2017
- TOKYO ELECTRON LIMITED
- Tamotsu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20160351390
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Tamotsu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20150357187
- Publication date Dec 10, 2015
- TOKYO ELECTRON LIMITED
- Tamotsu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20090291564
- Publication date Nov 26, 2009
- TOKYO ELECTRON LIMITED
- Tamotsu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming method and apparatus
- Publication number 20070243327
- Publication date Oct 18, 2007
- Song Yun Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and processing method, and flat panel d...
- Publication number 20070045242
- Publication date Mar 1, 2007
- Naohisa Goto
- Naohisa Goto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for plasma processing
- Publication number 20050000654
- Publication date Jan 6, 2005
- TOKYO ELECTRON LIMITED
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for and method of processing an object to be processed
- Publication number 20020179249
- Publication date Dec 5, 2002
- TOKYO ELECTRON LIMITED
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS

Tamotsu Morimoto

Person

Patents Grantslast 30 patents

Substrate treatment method

Method for etching multilayer film

Method for etching object to be processed

Modification processing method and method of manufacturing semicond...

Modification processing method and method of manufacturing semicond...

Apparatus and method for plasma processing

Method of etching

Apparatus for and method of processing an object to be processed

Apparatus for and method of processing an object to be processed

Plasma treatment system

Heat processing apparatus

Patents Applicationslast 30 patents

LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQU...

SUBSTRATE TREATMENT METHOD

METHOD FOR ETCHING MULTILAYER FILM

Nonvolatile Storage Device and Method of Fabricating Nonvolatile St...

METHOD FOR ETCHING OBJECT TO BE PROCESSED

MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...

MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...

APPARATUS AND METHOD FOR PLASMA PROCESSING

Film forming method and apparatus

Plasma processing apparatus and processing method, and flat panel d...

Apparatus and method for plasma processing

Apparatus for and method of processing an object to be processed