Tamotsu Shimizu

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Yokohama, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for controlling plasma processing
- Patent number 5,266,364
- Issue date Nov 30, 1993
- Hitachi, Ltd.
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 5,074,985
- Issue date Dec 24, 1991
- Hitachi, Ltd.
- Hitoshi Tamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conical-frustum sputtering target and magnetron sputtering apparatus
- Patent number 4,747,926
- Issue date May 31, 1988
- Hitachi, Ltd.
- Tamotsu Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for microwave assisting sputtering
- Patent number 4,721,553
- Issue date Jan 26, 1988
- Hitachi, Ltd.
- Hiroshi Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Continuous sputtering apparatus
- Patent number 4,675,096
- Issue date Jun 23, 1987
- Hitachi, Ltd.
- Hideki Tateishi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...