Tamotsu WATANABE

Person

Joetsu-shi, Niigata-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemically amplified negative resist composition and patterning pro...
- Patent number 9,075,306
- Issue date Jul 7, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning process
- Patent number 8,394,577
- Issue date Mar 12, 2013
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation process of chemically amplified resist composition
- Patent number 8,367,295
- Issue date Feb 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, resist pattern forming process, and photomask prep...
- Patent number 8,343,694
- Issue date Jan 1, 2013
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Synthesis of photoresist polymer
- Patent number 8,193,307
- Issue date Jun 5, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist patterning process and manufacturing photo mask
- Patent number 8,110,335
- Issue date Feb 7, 2012
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 7,977,027
- Issue date Jul 12, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition and patterning process using the same
- Patent number 7,501,223
- Issue date Mar 10, 2009
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...
- Publication number 20110294047
- Publication date Dec 1, 2011
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20110177464
- Publication date Jul 21, 2011
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING PROCESS
- Publication number 20100261123
- Publication date Oct 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Akinobu Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist patterning process and manufacturing photo mask
- Publication number 20100009271
- Publication date Jan 14, 2010
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYNTHESIS OF PHOTORESIST POLYMER
- Publication number 20090030177
- Publication date Jan 29, 2009
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...
- Publication number 20080305411
- Publication date Dec 11, 2008
- Shin-Etsu Chemical Co., Ltd.
- Ryuji KOITABASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20080274422
- Publication date Nov 6, 2008
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
- Publication number 20080241751
- Publication date Oct 2, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20080096128
- Publication date Apr 24, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymer, resist composition and patterning process using the...
- Publication number 20080090179
- Publication date Apr 17, 2008
- Shin-Etsu Chemical Co., Ltd.
- Takanobu Takeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20070111139
- Publication date May 17, 2007
- Shin-Etsu Chemical Co., Ltd.
- Takanobu TAKEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition and patterning process
- Publication number 20060166133
- Publication date Jul 27, 2006
- Shin-Etsu Chemical Co., Ltd.
- Ryuji Koitabashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Tamotsu WATANABE

Person

Patents Grantslast 30 patents

Chemically amplified negative resist composition and patterning pro...

Patterning process

Preparation process of chemically amplified resist composition

Photomask blank, resist pattern forming process, and photomask prep...

Synthesis of photoresist polymer

Resist patterning process and manufacturing photo mask

Resist composition and patterning process

Polymer, resist composition and patterning process using the same

Patents Applicationslast 30 patents

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

PATTERNING PROCESS

Resist patterning process and manufacturing photo mask

SYNTHESIS OF PHOTORESIST POLYMER

PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK PREP...

PREPARATION PROCESS OF CHEMICALLY AMPLIFIED RESIST COMPOSITION

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...

RESIST COMPOSITION AND PATTERNING PROCESS

Novel polymer, resist composition and patterning process using the...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS

Negative resist composition and patterning process