Tangkuei Wang

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Kurokawa-gun, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of etching and apparatus for plasma processing
- Patent number 11,955,342
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND RF SYSTEM
- Publication number 20240087846
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Toshiharu WADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING AND APPARATUS FOR PLASMA PROCESSING
- Publication number 20210296134
- Publication date Sep 23, 2021
- TOKYO ELECTRON LIMITED
- Masanori Hosoya
- H01 - BASIC ELECTRIC ELEMENTS